High-rate magnetron sputtering

Musil, J.; Rajský, A.; Bell, A. J.; Matouš, Jaroslav; Čepera, M.; Zeman, J.

doi:10.1116/1.580045

Cited by 49 publications

(15 citation statements)

References 3 publications

(3 reference statements)

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“…This is due to the coating hardness of about 25 GPa [2], which exceeds the bulk material hardness by many times. Necessary for synthesis of titanium nitride and other hard coatings metal vapor is produced by means of vacuum arc evaporation [3] and magnetron sputtering [4]. To prevent from droplets in the coatings the vacuum arc plasma can be filtered [5].…”

Section: Introductionmentioning

confidence: 99%

Sharpening of ceramic knife-edges and production of plasma for cutting tools nitriding with the use of a broad fast molecule beam

Metel

2016

Mechanics & Industry

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-A source of gas molecules with energy ranging from 0.5 up to 4 keV has been used for production of non-self-sustained glow discharge plasma. Cutting tools immersed in nitrogen plasma are heated by the fast molecules but they are not sputtered by ions from the plasma. During nitriding of a tool the fast molecules sputter its cutting edges with the same rate as the rest of the tool surface. It results in a decrease of the edge radius. For sharpening of ceramic knife-edges were used fast neutral argon atoms, which sputter materials more intensively than nitrogen molecules.

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Section: Introductionmentioning

confidence: 99%

Sharpening of ceramic knife-edges and production of plasma for cutting tools nitriding with the use of a broad fast molecule beam

Metel

2016

Mechanics & Industry

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“…In addition to the vacuum arc, magnetron sputtering systems [13][14][15][16][17] and hollow cathode sputtering systems [18][19][20][21][22] can be also used for the coating deposition. In all cases, the coating is bombarded during the synthesis by ions accelerated from the gas discharge plasma [23][24][25][26] or using broad beam sources of ions or fast gas atoms [27][28][29].…”

Section: Introductionmentioning

confidence: 99%

Equipment and Technology for Combined Ion–Plasma Strengthening of Cutting Tools

et al. 2018

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Y.A.M.); m.volosova@stankin.ru (M.A.V.)Abstract: A combined strengthening of cutting tools for finishing has been carried out in glow discharge plasma filling a process vacuum chamber. At the first stage, reamers rotating around the axis distanced from the magnetron targets at 8 cm were bombarded by fast argon atoms produced due to charge exchange collisions of ions accelerated in space charge sheathes between the plasma and a negatively biased to 3 kV grid with a 25 cm radius of its concave surface curvature. The reamer bombardment by fast neutral atoms led to a reduction of its cutting-edge radius from~7 µm to~2 µm. At the second stage, the reamer surface was nitrided within 1 h at a temperature of 500 • C stabilized by regulation of the negative bias voltage accelerating the nitrogen ions. At the third stage, a 3 µm thick TiN coating has been synthesized on the reamer bombarded by pulsed beams of 3 keV neutral atoms at a 50 Hz repetition rate of 50 µs wide pulses. After the combined strengthening, the cutting edge radius of the coated reamer amounted to~5 µm and the roughness of the area machined by the reamer holes in blanks made of structural steel reduced by about 1.5 times.

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“…Another method widely used for the production of titanium vapor is magnetron sputtering [8], which excludes the metal droplets. However, the magnetron sputtering is characterized by a low efficiency of the target material use, a low ionization degree of sputtered atoms and a low plasma density near the product surface.…”

Section: Introductionmentioning

confidence: 99%

A new method for production of titanium vapor and synthesis of titanium nitride coatings

Grigoriev

Melnik

Metel

et al. 2017

Mechanics & Industry

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It is proposed to synthesize on machine parts and cutting tools wear-resistant titanium nitride coatings with the help of the hollow-cathode glow discharge, a molybdenum crucible for titanium evaporation being used as the anode of the discharge and a process vacuum chamber being used as the hollow cathode. The research revealed that at the anode surface area less than a critical value S* = (2m/M) 1/2 S, where S is the area of the chamber walls, m is the mass of electrons and M is the mass of ions, the anode fall of potential is positive and grows from ∼50 V at argon pressure p = 0.2 Pa to ∼2 kV at p = 0.02 Pa. At the discharge current I = 0.6 A electrons accelerated by the anode fall of 0.9 kV transport into the crucible with the inner diameter of 12 mm the power of ∼0.54 kW, which allows the titanium evaporation and the coating deposition rate of 5 mm·h À1 on a substrate distanced from the crucible at 100 mm. After the argon is replaced with the nitrogen, titanium nitride coating without titanium droplets is synthesized the deposition rate amounting to about the same value.

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High-rate magnetron sputtering

Cited by 49 publications

References 3 publications

Sharpening of ceramic knife-edges and production of plasma for cutting tools nitriding with the use of a broad fast molecule beam

Sharpening of ceramic knife-edges and production of plasma for cutting tools nitriding with the use of a broad fast molecule beam

Equipment and Technology for Combined Ion–Plasma Strengthening of Cutting Tools

A new method for production of titanium vapor and synthesis of titanium nitride coatings

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