Production of thin metallic and dielectric coatings by a plasma technique and their investigation

High-permittivity YScO3thin films by atomic layer deposition using two precursor approaches

“…sputtering 6,7 and electron beam evaporation. 8 To the best of our knowledge, chemical vapor deposition (CVD) of YScO 3 or deposition by other chemical vapor phase methods have not been studied earlier.…”

“…12 YScO 3 thin films prepared by PVD methods have been found to form amorphous solid solutions of Y 2 O 3 and Sc 2 O 3 rather than ternary compounds. 6,8 Nevertheless, the amorphous structure is often beneficial and provides better dielectric properties than the polycrystalline structure. Dielectric constant of 12-17 has been reported for the sputtered YScO 3 film with a thickness of 50-1000 nm.…”