2019
DOI: 10.1016/j.apsusc.2018.10.068
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Probing surface electronic properties of a patterned conductive STO by reactive ion etching

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Cited by 9 publications
(12 citation statements)
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“…Conducting surfaces of STO (oxygen vacancy mediated) have electron mean free path lengths up to 500 nm . From a previous study on the surface conductivity of STO via Ar plasma treatment, we demonstrated λ e ∼ 100 nm. In this work, we use a channel width of 1 μm with λ e ≪ w ≪ λ s in the spin Hall regime where the nonlocal resistance change is , where γ is the spin Hall angle, defined as the spin Hall conductivity divided by the charge conductivity (or, on the conducting surface, and R sq is the sheet resistance of STO.…”
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confidence: 73%
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“…Conducting surfaces of STO (oxygen vacancy mediated) have electron mean free path lengths up to 500 nm . From a previous study on the surface conductivity of STO via Ar plasma treatment, we demonstrated λ e ∼ 100 nm. In this work, we use a channel width of 1 μm with λ e ≪ w ≪ λ s in the spin Hall regime where the nonlocal resistance change is , where γ is the spin Hall angle, defined as the spin Hall conductivity divided by the charge conductivity (or, on the conducting surface, and R sq is the sheet resistance of STO.…”
mentioning
confidence: 73%
“…Substrates are cleaned by acetone, ethanol, and deionized water with ultrasonic treatment. Ar plasma treatment is used for creating oxygen vacancies on the STO surface, which leads to conductive surface . In situ Ar plasma (50 W power) treatment is applied to the STO surface for 30–60 min at a pressure of 30 mTorr with an Ar atmosphere.…”
Section: Methodsmentioning
confidence: 99%
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“…In contrast, the oxygen-vacancy-induced conductivity is expected to have greater tunability since oxygen vacancies are rather mobile and can be modulated after growth easily. High-temperature reduction in a vacuum or in hydrogen, , low-energy Ar ion bombardment, reactive ion etching, and surface scratching have been employed to tune the oxygen vacancies and carrier concentrations in bulk STO or STO-based heterostructures. Nonetheless, the electron mobility values obtained by these methods are not very high, and the sample surface may be damaged in some cases.…”
Section: Introductionmentioning
confidence: 99%