Probe shape measurement in an electron beam lithography system

Abstract

Real-time determination of electron-beam probe shape using an in situ fiducial grid Optimized design for the scattering with angular limitation in projection electron-beam lithography based electron projection systemWe have devised a method of quantifying the size and shape of the probe in a Gaussian-beam lithography system. The technique is robust, being insensitive to noise, but is sensitive to changes in the probe size of as little as ±0.5 nm. We have determined that the probe shape of our system is indeed well fit by a Gaussian, with a best-focus full-width half-maximum of 6.5± 1 nm. We are able readily to quantify the effects of astigmatism on the system. In addition, the approach we describe can be extended to deal with arbitrary point-spread functions.

The link between nanoscale feature development in a negative resist and the Hansen solubility sphere

“…These solvents were chosen because they have χ values that differ beyond experimental errors associated with the Hansen sphere fitting and have similar molar volumes. Figure 4 shows the simulated cross‐sectional line profiles of 20 nm lines for the four tested solvents considering the dose, the shape of the incident beam as Gaussian (measured as 7 nm half‐width for this system17), the writing strategy (a line in the center of the grating, midway between the horizontal supports with pixel size = 2 nm, line width = 20 nm, line pitch = 40 nm, 10 parallel lines written), and the contrast curves (Fig. 3).…”

Automatic measurement of electron beam size by beam metrology technique using 20nm test pattern

“…2,3 They can also be too complex when using a combination of SEM and transmission electron microscopy at equal beam voltage. 4 Most promising recent works reported a method based on the spatial spectral analysis and comparison of a known predefined pattern to its image acquired by SEM. 5,6 The approach described in Ref.…”

Technique to automatically measure electron-beam diameter and astigmatism:BEAMETR

“…4 BEAMETR ͑beam metrology͒ is a technique that employs a prefabricated pattern and special software to measure the beam size. Analytical methods based on Fourier transform analysis have been developed; 1,2 however, they are not yet reliable enough, especially when applied to small beams.…”