PREVAIL: Dynamic correction of aberrations

Gordon, Michael S.; Enichen, W. A.; Golladay, S. D.; Pfeiffer, H. C.; Robinson, Chris; Stickel, W.

doi:10.1116/1.1319710

Cited by 5 publications

(1 citation statement)

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“…A complete listing of third-order distortion aberrations is shown in Table I, according to the nomenclature of Munro 13 for a projection or shaped beam system. 8 To experimentally determine the sensitivity of the subfield shape with the excitation of the dynamic correction elements, we exposed a single subfield consisting of a regular array of 9 ϫ 9 L-shaped features ͑L patterns͒. Also shown in the table are the methods or means for correcting or mitigating each of the distortion aberrations.…”

Section: Distortion Aberrations and Dynamic Correction Adjustmentmentioning

confidence: 99%

PREVAIL-EPL alpha tool: Early results

Golladay

Pfeiffer

Bohnenkamp

et al. 2001

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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The IBM/Nikon alliance is developing an EPL stepper alpha tool based on the PREVAIL technology. This article provides a status report on the alliance activity with particular focus on the electron optical subsystem developed at IBM. We have previously described design features of the PREVAIL Alpha system. The state-of-the-art e-beam lithography concepts have since been reduced to practice and turned into functional building blocks of a production level lithography tool. The electron optical subsystem has been designed, built, assembled, and tested at IBM’s Semiconductor Research and Development Center (SRDC) in East Fishkill, NY. After demonstrating subsystem functionality, the column, an interim mechanical system and all associated control electronics hardware and software have been shipped during January 2001 to Nikon’s facility in Kumagaya, Japan, for integration into the Nikon commercial e-beam stepper Alpha tool. Postshipment activity has been directed primarily toward demonstrating subfield stitching, a task which exercises system architecture, calibration, stability, and noise performance.

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Section: Distortion Aberrations and Dynamic Correction Adjustmentmentioning

confidence: 99%