Lithography

Lucas, Kevin; Postnikov, Sergei V.; Henderson, Cliff; Hector, Scott Daniel

doi:10.1016/b978-044451494-3/50003-2

Nano and Giga Challenges in Microelectronics 2003

DOI: 10.1016/b978-044451494-3/50003-2

|View full text |Cite

Lithography

Kevin Lucas

Sergei V. Postnikov

Cliff Henderson

et al.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

Supporting

Mentioning

Contrasting

Year Published

2005

2012

Publication Types

Select...

Other2

Relationship

Self Cite1

Independent1

Authors

Journals

Cited by 2 publications

References 168 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

Recent Advances in Lithography and High Level Critical Dimension Metrology Needs for Lithography

Hector¹

2005

AIP Conference Proceedings

Self Cite

View full text Add to dashboard Cite

The status and future of imaging metrology needs for lithography AIP Conf. Proc. 550, 339 (2001); 10.1063/1.1354422Metrology needs for the semiconductor industry over the next decade AIP Conf.Abstract. To enable patterning of 65-nm half pitch and smaller dimensions, optical projection lithography is being extended with 193-nm wavelength using water immersion lenses. To enable this extension more complex masks and greater comprehension of variations in the lithography process are being integrated into the integrated circuit design process. Metrology will play a critical role in defining these lithography friendly design rules and practices. The effects of line edge and line width roughness are also becoming increasingly apparent in device performance, so metrology tools need to be modified to accurately measure these variations as well. Tools for measuring critical dimensions, including roughness, with high precision and for quantifying pattern fidelity will be critical to enable the extension of lithography to smaller dimensions.

show abstract

Recent Advances in Lithography and High Level Critical Dimension Metrology Needs for Lithography

Hector¹

2005

AIP Conference Proceedings

Self Cite

View full text Add to dashboard Cite

show abstract

Design of an aerostatic imprint head with off-plane alignment functionality for nanoimprint lithography

Chen

et al. 2012

2012 IEEE International Conference on Robotics and Biomimetics (ROBIO)

View full text Add to dashboard Cite

Ultra-precision off-plane alignment between the template and the substrate is of great importance to guarantee the quality of patterns manufactured by nanoimprint lithography technology. In this paper, an aerostatic imprint head with off-plane alignment functionality for nanoimprint lithography is developed. The high light of the mechanical design is that the imprint force is transmitted by a spherical aerostatic bearing to the high stiffness frame, thus, bypassing the compliant mechanism, which is employed for high precision off-plane adjustments. This makes the developed device suitable for high load applications while maintaining high alignment precision. The load capacity and stiffness of the imprint device, which are mostly determined by the aerostatic bearing, are studied based on theoretical analysis and experiments. To further increase the stiffness of the device, adjustable magnetic preload is employed. An experiment is performed to study the mechanical characteristics of the imprint head incorporating the magnetic preload structure.

show abstract

scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.

Contact Info

hi@scite.ai

10624 S. Eastern Ave., Ste. A-614

Henderson, NV 89052, USA

Blog Terms and Conditions API Terms Privacy Policy Contact Cookie Preferences Do Not Sell or Share My Personal Information

Made with 💙 for researchers

Part of the Research Solutions Family.

Lithography

Cited by 2 publications

References 168 publications

Recent Advances in Lithography and High Level Critical Dimension Metrology Needs for Lithography

Recent Advances in Lithography and High Level Critical Dimension Metrology Needs for Lithography

Design of an aerostatic imprint head with off-plane alignment functionality for nanoimprint lithography

Contact Info

Product

Resources

About