“…The first synthesis of homogeneous SiGe alloys can be traced back to the work by Stöhr and Klemm (1939). The solution technique (Miller and Grieco, 1962;Donnelly and Milnes, 1966) and the vapor deposition technique (Riben et al, 1966) were frequently adopted to deposit SiGe alloys and Ge films on Si substrates during this period. It was in the 1960s that studies on strained SiGe alloys grown on Si substrates began to appear.…”