“…However, the ZnO films with this preferred orientation also have grains with other crystal orientations, [i.e., (100) or (101)] which reduce the magnitude of the anisotropic piezoelectric and electro-optic properties. Various deposition methods for the growth of ZnO thin films can be carried out using sputter deposition [9,10], chemical vapor deposition [11], spray pyrolysis [12], pulsed laser deposition [13], sol-gel [14], and reactive evaporation [15]. Among these techniques, sputter deposition techniques, using either direct current (dc) or radio frequency (rf), are most commonly used due to the combined advantages of lower deposition temperatures, higher deposition rates, and compatibility with integrated circuit (IC) processing.…”