Preparation and characterization of metalorganic chemical vapor deposited nickel oxide and lithium nickel oxide thin films

Eleruja, Marcus Adebola; Egharevba, Gabriel O.; Abulude, O. A.; Akinwunmi, Olumide Oluwole; Jeynes, C.; Ajayi, E. O. B.

doi:10.1007/s10853-006-1405-9

Cited by 16 publications

(9 citation statements)

References 29 publications

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“…The spectrum indicates a good fit and using DataFurnace Code (Jeynes et al, 2003), the ratio of Li:Cr:O was estimated to be 36:18:46 leading to stoichiometry of Li 2 CrO 2+δ (δ = 0.5) . It was also observed that the ratio of Li:Cr in the thin films confirmed our earlier reports on vanadium cobalt oxide systems (Adedeji, Egharevba, Jeynes, & Ajayi, 2002) and lithium nickel oxide (Eleruja et al, 2007) that the Li:Cr ratio in the precursor is different from that in the film. In our earlier reports, we attributed this difference to the possible reconstitution of the structure and bonds at the formation stage of the films.…”

Section: Compositional Studysupporting

confidence: 88%

“…The profile shows that there is diffusion of some materials across the film-substrate interface. This feature had been observed in many thin film systems (Eleruja et al, 2007;Ajayi, Akanni, Lambi, Jeynes, & Watts, 1990), where different elements migrated from the substrates to the films.…”

Section: Compositional Studymentioning

confidence: 64%

“…Indeed, the insertion of lithium, sodium and other metals into transition metal oxide matrix has been used to modify or improve the various properties of the oxides particularly for electrochromic use and lithium batteries (Cogan et al, 1997). Some of these materials which have been prepared by various researchers include: Lithium chromate (Cogan et al, 1997), Vanadium bronzes of Li x V 2 O 5 (Delmas, Brethes, & Menetrier, 1991); Co-V-O, Cr-V-O thin films (Adedeji, Egharevba, Jeynes, & Ajayi, 2002); Li-Co-O, Na-Ni-O, Na-Co-O (Eleruja, 1998); LiNiO (Eleruja et al, 2007); M x WO 3 (M = H, Li, Na or K) (Rowleley & Mortimer, 2002); LiMoO thin films (Ilori et al, 2005). Preparation techniques such as sputtering (Larsson & Niklasson, 2004;Fan, 1978), metal organic chemical vapour deposition (Adedeji, Egharevba, Jeynes, & Ajayi, 2002;Eleruja, 1998;Eleruja et al, 2007;Ilori et al, 2005), electrochemical deposition (Díaz-Carrasco, Moreau, Guyomard, Kuhn, & García-Alvarado, 2006) among others, have been employed to prepare these films.…”

Section: Introductionmentioning

confidence: 99%

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Synthesis and Some Properties of Metal Organic Chemical Vapour Deposited Lithium Chromium Oxide Thin Films

Egharevba

Eleruja

Osasona

et al. 2011

JMSR

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Thin Films of Lithium Chromium Oxide were deposited on soda lime glass substrates at a temperature of 420 °C by the pyrolysis of a mixture of Lithium Hydroxide and Chromium Acetylacetonate (1:2), using Metal Organic Chemical Vapour Deposition technique. The prepared thin films were characterized by using Rutherford Backscattering (RBS), X-Ray Diffraction (XRD) and Ultraviolet-Visible Spectrophotometry. Using RBS the ratio of Li:Cr:O in the prepared thin films was found to be 36:18:46, leading to a stoichiometry of Li 2 CrO 2+δ (δ = 0.5). A direct allowed bandgap of 3.58 eV was obtained from the UV-Visible spectrum, with a blank soda lime glass substrate in the path of the reference beam.

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Section: Compositional Studysupporting

confidence: 88%

Section: Compositional Studymentioning

confidence: 64%

Section: Introductionmentioning

confidence: 99%

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Synthesis and Some Properties of Metal Organic Chemical Vapour Deposited Lithium Chromium Oxide Thin Films

Egharevba

Eleruja

Osasona

et al. 2011

JMSR

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“…It was also observed that the ratio of Li : Mn in the precursor is different from that of the film. Such difference has been observed in some of our works on mixed metal oxides produced from mechanical mixing of precursors [22][23][24]. This difference can be attributed to a possible breakdown of the metal-metal bond of the precursor in the vapour phase at the deposition temperature and subsequent reconstitution of the bonds leading to a different stoichiometry of the film.…”

mentioning

confidence: 54%

“…Our simple set up has been used in the past to produce good quality thin films that have shown excellent properties. In this study, we report the [22][23][24]. The results of the investigations of some of the basic properties of the deposited thin films are also presented.…”

Section: Introductionmentioning

confidence: 99%

Some Properties of Manganese Oxide (Mn-O) and Lithium Manganese Oxide (Li-Mn-O) Thin Films Prepared via Metal Organic Chemical Vapor Deposition (MOCVD) Technique

Oyedotun¹,

Eleruja²,

Olofinjana³

et al. 2015

JMSE-B

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°C for approximately 2 h. The films were characterized using RBS (Rutherford backscattering spectroscopy), SEM (Scanning electron microscopy), XRD (X-ray diffraction), van der Pauw method and Ultraviolet-Visible Spectroscopy. The compositional analysis showed that the Mn:O ratio is 0.2:0.8 while that of Li:Mn:O was found to be 0.47:0.24:0.29. SEM micrograph showed that Mn-O film is composed of hollow needle-like rods with coarse, continuous and uniformly distributed polycrystalline grains rod-like, having average grain size estimated to be below 10µm while those of Li-Mn-O showed that the film is dendritic and polycrystalline in which some of the grains were found to lump together. XRD also showed the polycrystalline nature of the films with orthorhombic MnO 2 and orthorhombic Li 3 MnO 4 structures for Mn-O and Li-Mn-O thin films respectively. Results of characterization also showed that the films are semiconducting, highly absorbing in the visible region with absorption edges observed at wavelengths of 525 nm and 550 nm, corresponding to direct optical band gaps of 2.36 eV and 2.25eV for Mn-O and Li-Mn-O thin films respectively.

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Metallic Materials Deposition: Metal‐Organic PrecursorsUpdate based on the original article by Charles H. Winter, Wenjun Zheng and Hani M. El‐Kaderi,Encyclopedia of Inorganic ChemistrySecond Edition, © 2005, John Wiley & Sons, Ltd.

Winter

Knisley

Kalutarage

et al. 2012

Encyclopedia of Inorganic and Bioinorganic Chemistry

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This review describes metal‐organic precursors for the growth of metal‐containing thin films by chemical vapor deposition (CVD)‐based methods. The major emphasis is on precursors that have been reported since 2004, which corresponds to a time of major growth in this field. Progress in the development of metal‐organic precursors is documented for the main group, lanthanide, and group 4– 11 elements. In the main group elements, there has been considerable research activity directed toward the identification of strontium and barium precursors, due both to the technological importance of mixed oxide phases and the inherent difficulties in obtaining volatile, stable thermally complexes of these large metal ions. Aluminum, gallium, and indium have also been the subject of intense investigation because of the importance of many phases containing these elements. The group 4 and 5 elements titanium, zirconium, hafnium, niobium, and tantalum have been the subject of considerable precursor development activity because of the importance of several mixed oxide phases and the applications of zirconium oxide and hafnium oxide as high‐permittivity gate materials in microelectronic devices. Growth of metal nitride films of these elements has also been an active area of research for use as barrier materials in microelectronic devices. The deposition of copper and other first‐row transition‐metal films from metal‐organic precursors is driven by the urgent need for copper metalization procedures in microelectronics device manufacturing. The atomic layer deposition (ALD) growth of the noble metals ruthenium, rhodium, iridium, palladium, and platinum has been a very active research area. The current state of metal‐organic precursor development is presented for each of these metallic elements.

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Preparation and characterization of metalorganic chemical vapor deposited nickel oxide and lithium nickel oxide thin films

Cited by 16 publications

References 29 publications

Synthesis and Some Properties of Metal Organic Chemical Vapour Deposited Lithium Chromium Oxide Thin Films

Synthesis and Some Properties of Metal Organic Chemical Vapour Deposited Lithium Chromium Oxide Thin Films

Some Properties of Manganese Oxide (Mn-O) and Lithium Manganese Oxide (Li-Mn-O) Thin Films Prepared via Metal Organic Chemical Vapor Deposition (MOCVD) Technique

Metallic Materials Deposition: Metal‐Organic PrecursorsUpdate based on the original article by Charles H. Winter, Wenjun Zheng and Hani M. El‐Kaderi,Encyclopedia of Inorganic ChemistrySecond Edition, © 2005, John Wiley & Sons, Ltd.

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