Preliminary study on development of 300 Kv compact focused gaseous ion beam system

Ohkubo, Takeru; Ishii, Yasuyuki; Miyake, Yoshinobu; Kamiya, Takahiro

doi:10.1063/1.4802353

Cited by 5 publications

(3 citation statements)

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“…Ohkubo et al [89] developed a compact system at the Japan Atomic Energy Agency (JAEA) for various gaseous ion beams capable of reaching 300 keV. Ohkubo et al [89] developed a compact system at the Japan Atomic Energy Agency (JAEA) for various gaseous ion beams capable of reaching 300 keV.…”

Section: Ion Beam Lithographymentioning

confidence: 99%

Two-Photon Polymerization as a Component of Desktop Integrated Manufacturing Platforms

Martínez-Chapa¹,

Salazar²,

Madou³

2016

Three-Dimensional Microfabrication Using Two-Photon Polymerization

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Section: Ion Beam Lithographymentioning

confidence: 99%

Two-Photon Polymerization as a Component of Desktop Integrated Manufacturing Platforms

Martínez-Chapa¹,

Salazar²,

Madou³

2016

Three-Dimensional Microfabrication Using Two-Photon Polymerization

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“…The beam diameter in full width at half maximum (FWHM) was calculated by fitting of the error function to the beam current as a function of the knife-edge position. 7 The beam current was approximately 3 pA with the stability of 10% for the all kinetic energy. The beam current condition was maintained unless the electric breakdown occurred.…”

mentioning

confidence: 99%

“…Because the ions move in the vicinity of the optical axis in cylindrical coordinates, the ions accordingly behave in the paraxial approximation described as the paraxial ray equation. 7 Then, the focal length for a pair of electrodes f is described as where L is the distance between the electrodes. The focal length is invariable when the acceleration ratio is kept constant, which is the key characteristic of the gas-FIB system leading to the expectation of its use as a powerful tool for 3D PBW.…”

mentioning

confidence: 99%

Note: Proton microbeam formation with continuously variable kinetic energy using a compact system for three-dimensional proton beam writing

Ohkubo

Ishii

2015

Review of Scientific Instruments

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A compact focused gaseous ion beam system has been developed to form proton microbeams of a few hundreds of keV with a penetration depth of micrometer range in 3-dimensional proton beam writing. Proton microbeams with kinetic energies of 100-140 keV were experimentally formed on the same point at a constant ratio of the kinetic energy of the object side to that of the image side. The experimental results indicate that the beam diameters were measured to be almost constant at approximately 6 µm at the same point with the kinetic energy range. These characteristics of the system were experimentally and numerically demonstrated to be maintained as long as the ratio was constant. C 2015 AIP Publishing LLC. [http://dx.Ion microbeams from several hundreds of keV to several MeV have been applied for micro and nanofabrications. Proton microbeams in a few MeV range are especially used for microfabrications using photo-resists in proton beam writing (PBW). 1-6 A proton beam has a longer penetration depth than an electron beam with the same kinetic energy because of the highly straight penetration into materials on the low struggling effect. In addition, the penetration depth of the proton beam can be controlled by changing its kinetic energy. Because a proton microbeam with a kinetic energy of approximately 1 MeV has a penetration depth of micrometer range, 7,8 a 3-dimensional (3D) structure with a high aspect ratio can be made by beam writing directly using different kinetic energies of proton beams for a sample in 3D PBW. 4-6 Although 3D PBW is a promising tool for microfabrications in various small laboratories, the microbeams are presently formed using a long, large microbeam lens system in a large facility. In addition, when the kinetic energy of the microbeam is changed to another energy for the 3D PBW, more than one hour is required to obtain the same beam diameter by adjusting many parameters in the lens system (e.g., quadrupole magnets). To use the proton microbeam widely for 3D PBW applications, a compact system in keV range, namely, a focused gaseous ion beam (gas-FIB), has been developed at Japan Atomic Energy Agency (JAEA). 9,10 The gas-FIB system has a plasma ion source using hydrogen gas to generate a proton beam and is composed of a series of two electrostatic lenses, called the "acceleration lens system," each of which is a pair of disk-shaped electrodes with a small center hole (hereinafter referred to as acceleration lens). 10 The acceleration lens system has an extraction stage and a few acceleration stages. In each acceleration lens, the ion beam is strongly focused and weakly defocused around the objectside electrode and the image-side electrode, respectively. 11 Demagnification of an acceleration lens M is described by the following equation: a) Electronic mail: ohkubo.takeru@jaea.go.jp.where θ ob and θ im are halves of the beam divergence angles, and ε ob and ε im are the kinetic energies for the object and image sides, respectively. Here, (ε im /ε ob ) is defined as the acceleration ratio. The dema...

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Two-photon polymerization as a component of Desktop-Integrated Manufacturing Platforms

Martínez-Chapa¹,

Salazar²,

Madou³

2020

Three-Dimensional Microfabrication Using Two-Photon Polymerization

View full text Add to dashboard Cite

Preliminary study on development of 300 Kv compact focused gaseous ion beam system

Cited by 5 publications

References 0 publications

Two-Photon Polymerization as a Component of Desktop Integrated Manufacturing Platforms

Two-Photon Polymerization as a Component of Desktop Integrated Manufacturing Platforms

Note: Proton microbeam formation with continuously variable kinetic energy using a compact system for three-dimensional proton beam writing

Two-photon polymerization as a component of Desktop-Integrated Manufacturing Platforms

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