Two-Photon Polymerization as a Component of Desktop Integrated Manufacturing Platforms

Martínez-Chapa, Sergio O.; Salazar, Arnoldo; Madou, Marc

doi:10.1016/b978-0-323-35321-2.00019-4

Cited by 5 publications

(4 citation statements)

References 128 publications

(107 reference statements)

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“…It then returns to the left-hand side of the wafer where it scans a new line until having analysed the entire surface, only switching on when the exposure is required. In a vector scan, the image is split into vectors, which contain the features and, instead of scanning the entire wafer, the electron beam moves from feature to feature [ 13 ]. The photomasks consist of a chrome layer deposited on a quartz substrate where the chrome layer is etched to create the pattern, which will be transferred to the photoresist, whilst the quartz substrate allows the electron transmission [ 127 ].…”

Section: Conventional Lithographic Techniquesmentioning

confidence: 99%

“…The amount of forward scattering is also reduced since the heavier ions have more momentum than electrons; the combination of the higher mass and momentum of the ions decreases the beam wavelength in comparison to an electron beam, drastically decreasing the amount of diffraction and increasing the resolution [ 20 ]. Furthermore, structures produced with FIBL are subjected to less radiation damage than EBL, due to FIBL having a high exposure sensitivity (with only 1–10% of particles being required in comparison to EBL to expose the resist) and the resist absorbing the majority of the ions [ 13 ].…”

Section: Conventional Lithographic Techniquesmentioning

confidence: 99%

“…Scanning probe lithography (SPL) encompasses a group of techniques in which a small probe, such as the tip utilised in atomic force microscopy (AFM) and scanning tunnelling microscopy (STM), to change the substrate’s chemical or structural properties within the probe’s immediate vicinity [ 13 ]. For example, thermal scanning probe lithography (tSPL) is a maskless lithographic technique that employs a cantilever with a heated probe to pattern a material at the point of interaction with the surface.…”

Section: Conventional Lithographic Techniquesmentioning

confidence: 99%

“…Lithography is a fabrication technique which enables the patterning of structures on a substrate [ 10 ]. Two of the most common lithographic techniques are photolithography (PL), which involves applying light through a mask onto a photosensitive resist to generate structures [ 11 ] and electron beam lithography (EBL), where electrons scan a surface covered in a sensitive resist, with the electron beam turning on and off to produce structures in the desired locations [ 12 , 13 ]. Table 1 provides an overview of the most common conventional lithographic techniques [ 12 – 26 ].…”

Section: Introductionmentioning

confidence: 99%

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Advances in lithographic techniques for precision nanostructure fabrication in biomedical applications

Stokes,

Clark,

Odetade

et al. 2023

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Nano-fabrication techniques have demonstrated their vital importance in technological innovation. However, low-throughput, high-cost and intrinsic resolution limits pose significant restrictions, it is, therefore, paramount to continue improving existing methods as well as developing new techniques to overcome these challenges. This is particularly applicable within the area of biomedical research, which focuses on sensing, increasingly at the point-of-care, as a way to improve patient outcomes. Within this context, this review focuses on the latest advances in the main emerging patterning methods including the two-photon, stereo, electrohydrodynamic, near-field electrospinning-assisted, magneto, magnetorheological drawing, nanoimprint, capillary force, nanosphere, edge, nano transfer printing and block copolymer lithographic technologies for micro- and nanofabrication. Emerging methods enabling structural and chemical nano fabrication are categorised along with prospective chemical and physical patterning techniques. Established lithographic techniques are briefly outlined and the novel lithographic technologies are compared to these, summarising the specific advantages and shortfalls alongside the current lateral resolution limits and the amenability to mass production, evaluated in terms of process scalability and cost. Particular attention is drawn to the potential breakthrough application areas, predominantly within biomedical studies, laying the platform for the tangible paths towards the adoption of alternative developing lithographic technologies or their combination with the established patterning techniques, which depends on the needs of the end-user including, for instance, tolerance of inherent limits, fidelity and reproducibility.

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Section: Conventional Lithographic Techniquesmentioning

confidence: 99%

Section: Conventional Lithographic Techniquesmentioning

confidence: 99%

Section: Conventional Lithographic Techniquesmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Advances in lithographic techniques for precision nanostructure fabrication in biomedical applications

Stokes,

Clark,

Odetade

et al. 2023

Discover Nano

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3D‐Printed Holographic Fresnel Lenses

et al. 2022

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Additive manufacturing processes are capable of fabricating optical devices, including the production of contact lenses, waveguides, and Fresnel lenses used in a variety of applications. This study presents a novel fabrication method for high‐quality Fresnel lenses through a vat photopolymerization 3D printing method. Here, the 3D printing process is integrated with the micro/nanostructure fabrication to produce 3D optical components with imprinted micro/nanostructures in a single step. This straightforward approach allows imprinting a micro‐pattern (5 μm features size) onto the flat surface of a 3D‐printed Fresnel lens, achieve light focusing properties along with holographic rainbow effects. The printed lenses achieve focal lengths within ≤8 mm deviation from the predicted values. Such holographic Fresnel lenses are highly desirable in imaging‐based miniature spectrometers for mechanoluminescence sensoring. Thus, the masked stereolithography (MSLA) based 3D printing process can produce normal and holographic Fresnel lenses, vital in optical sensing and communication.

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