Two-photon polymerization as a component of Desktop-Integrated Manufacturing Platforms

Martínez-Chapa, Sergio O.; Salazar, Arnoldo; Madou, Marc

doi:10.1016/b978-0-12-817827-0.00059-x

Cited by 3 publications

(5 citation statements)

References 117 publications

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“…Electron beam lithography is a direct lithographic process that utilizes the power of focused beams of electrons to transfer an array of nano/micropatterns over the surface of substrate without the need of any mask. The process of electron beam lithography can either be additive (i.e., material depositing) or subtractive (i.e., removal of material) in nature [ 77 ]. This type of lithography process is also used for preparing stamps used in nanoimprint lithography.…”

Section: Fabrication Techniquesmentioning

confidence: 99%

A Review on Low-Dimensional Nanomaterials: Nanofabrication, Characterization and Applications

et al. 2022

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The development of modern cutting-edge technology relies heavily on the huge success and advancement of nanotechnology, in which nanomaterials and nanostructures provide the indispensable material cornerstone. Owing to their nanoscale dimensions with possible quantum limit, nanomaterials and nanostructures possess a high surface-to-volume ratio, rich surface/interface effects, and distinct physical and chemical properties compared with their bulk counterparts, leading to the remarkably expanded horizons of their applications. Depending on their degree of spatial quantization, low-dimensional nanomaterials are generally categorized into nanoparticles (0D); nanorods, nanowires, and nanobelts (1D); and atomically thin layered materials (2D). This review article provides a comprehensive guide to low-dimensional nanomaterials and nanostructures. It begins with the classification of nanomaterials, followed by an inclusive account of nanofabrication and characterization. Both top-down and bottom-up fabrication approaches are discussed in detail. Next, various significant applications of low-dimensional nanomaterials are discussed, such as photonics, sensors, catalysis, energy storage, diverse coatings, and various bioapplications. This article would serve as a quick and facile guide for scientists and engineers working in the field of nanotechnology and nanomaterials.

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Section: Fabrication Techniquesmentioning

confidence: 99%

A Review on Low-Dimensional Nanomaterials: Nanofabrication, Characterization and Applications

et al. 2022

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“…Also considered a "parallel" process, interference lithography represents a fast, straightforward and accurate approach for quasiperiodic structures with resolution below 10 nm, making it attractive for fabricating photonic crystals and metamaterials. 175 Another photon-based, maskless technique is stereolithography (SLA). In SLA, a computer-generated 3D design is "directly written" into a photoresist by focusing a laser beam of appropriate wavelength while following a sequence of stacked 2D layers which are thus photoprinted successively on top of each other by moving a "z" stage.…”

Section: Photostructuring Mipsmentioning

confidence: 99%

“…The resulting pattern may extend in 2D or 3D depending on the thickness of the reactive layer and it is generally further developed by thermal or chemical treatment in order to remove the unreacted photoresist. Also considered a “parallel” process, interference lithography represents a fast, straightforward and accurate approach for quasiperiodic structures with resolution below 10 nm, making it attractive for fabricating photonic crystals and metamaterials . Another photon-based, maskless technique is stereolithography (SLA).…”

Section: Photostructuring Mipsmentioning

confidence: 99%

“…Thus, multiphoton SLA enables a highly localized polymerization of the photoresist, which is essential for the direct writing of elaborate 3D geometries (Figure D). However, multiphoton SLA only affords a resolution of a few hundred nanometers and provides a low throughput as it belongs to “serial” processes, which operate with a multiexposure to light for the voxel-to-voxel printing of the resist. , Nevertheless, MSLA is compatible with a wide variety of photoresists including (meth)acrylates, epoxides, organically modified silica, and organically modified ceramics. − …”

Section: Photostructuring Mipsmentioning

confidence: 99%

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Photopolymerization and Photostructuring of Molecularly Imprinted Polymers

Paruli

Soppera

Haupt

et al. 2021

ACS Appl. Polym. Mater.

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Over the past few decades, molecularly imprinted polymers (MIPs) have become extremely attractive materials for biomimetic molecular recognition due to their excellent affinity and specificity, combined with robustness, easy engineering, and competitive costs. MIPs are synthetic antibody mimics obtained by the synthesis of 3D polymer networks around template molecules, thus generating specific binding cavities. Numerous efforts have been made to improve the performances and the versatility of MIPs, with a special focus on ways to control their size, morphology, and physical form for a given application. Gaining control over these parameters has allowed MIPs to adopt a defined micro- and nanostructure, providing access to nanocomposites and micro/nanosystems, with fine-tuned properties, which become critical for modern applications ranging from chemical sensing to bioimaging and medical therapy. In this rich and complex context, light as a cheap and versatile source of energy has emerged as a powerful tool for structuring MIPs. This review presents the most recent advances on structuring MIPs at the nano/microscale, using light as a stimulus to trigger the polymerization process. Thus, after a general introduction on radical polymerization of MIPs, with a special emphasis on photopolymerization by UV and visible light, the reader will be presented with ways of structuring MIPs by processes that are inherently spatially confined, such as localized photopolymerization and lithographic techniques, supported by representative examples and complemented with a final outlook on future trends in this field.

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“…Wavelength reduced to 193 nm or 248 nm [ 32 ] 65–130 nm [ 32 ] Improved resolution in comparison to traditional UV lithography [ 32 ] Shorter wavelengths are more easily reflected [ 33 ] Interference effects [ 32 ] Maximum total thickness variation is 0.5 µm [ 34 ] Low depth of focus [ 34 ] Extreme UV lithography Use UV light and mask to pattern a photoresist. Wavelength reduced to 13.5 nm [ 35 ] < 10 nm [ 36 ] Improved resolution in comparison to traditional UV lithography [ 36 ] Shorter wavelengths are more easily reflected [ 33 ] Low photon transmission efficiency [ 37 ] Defects in the photomask warp pattern [ 38 ] Secondary electrons cause blur [ 39 ] Increased stochastic pattern variations [ 40 ] X-ray lithography Use x-rays and mask to pattern a photoresist [ 41 ] 15 nm [ 42 ] Improved resolution in comparison to traditional UV lithography [ 42 ] Large substrate-mask distances do not cause diffraction/proximity effects until the feature width approaches 100 nm [ 43 ] Shorter wavelengths are more easily reflected [ 33 ] Masks are thin, fragile, and expensive [ 44 ] Secondary electrons cause blur [ 45 ] Electron beam lithography Use electrons to pattern a resist [ 46 ] > 10 nm [ 47 ] Precise control [ 48 ] Can pattern complex geometries [ 48 ] Beam can damage the substrate [ …”

Section: Introductionmentioning

confidence: 99%

Advances in lithographic techniques for precision nanostructure fabrication in biomedical applications

Stokes,

Clark,

Odetade

et al. 2023

Discover Nano

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Nano-fabrication techniques have demonstrated their vital importance in technological innovation. However, low-throughput, high-cost and intrinsic resolution limits pose significant restrictions, it is, therefore, paramount to continue improving existing methods as well as developing new techniques to overcome these challenges. This is particularly applicable within the area of biomedical research, which focuses on sensing, increasingly at the point-of-care, as a way to improve patient outcomes. Within this context, this review focuses on the latest advances in the main emerging patterning methods including the two-photon, stereo, electrohydrodynamic, near-field electrospinning-assisted, magneto, magnetorheological drawing, nanoimprint, capillary force, nanosphere, edge, nano transfer printing and block copolymer lithographic technologies for micro- and nanofabrication. Emerging methods enabling structural and chemical nano fabrication are categorised along with prospective chemical and physical patterning techniques. Established lithographic techniques are briefly outlined and the novel lithographic technologies are compared to these, summarising the specific advantages and shortfalls alongside the current lateral resolution limits and the amenability to mass production, evaluated in terms of process scalability and cost. Particular attention is drawn to the potential breakthrough application areas, predominantly within biomedical studies, laying the platform for the tangible paths towards the adoption of alternative developing lithographic technologies or their combination with the established patterning techniques, which depends on the needs of the end-user including, for instance, tolerance of inherent limits, fidelity and reproducibility.

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Two-photon polymerization as a component of Desktop-Integrated Manufacturing Platforms

Cited by 3 publications

References 117 publications

A Review on Low-Dimensional Nanomaterials: Nanofabrication, Characterization and Applications

A Review on Low-Dimensional Nanomaterials: Nanofabrication, Characterization and Applications

Photopolymerization and Photostructuring of Molecularly Imprinted Polymers

Advances in lithographic techniques for precision nanostructure fabrication in biomedical applications

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