Postgrowth Processing of Carbon Nanotube Arrays—Enabling New Functionalities and Applications

Yin, A.; Chik, H.; Xu, Jimmy

doi:10.1109/tnano.2004.824010

Cited by 20 publications

(11 citation statements)

References 30 publications

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“…Before the exposure of the CNTs out of the alumina template, dry-etching by either RIE or ion-milling was used to clean the surface and remove the amorphous carbon top layer. To keep the long exposed nanotubes from sticking together, we apply a wet-etching process, using a mixture of 6% H 3 PO 4 and 1.8% CrO 3 with dispersant of polymethacrylic acid or Gum Arabic, which we developed for both exposing the nanotubes to a given length and keeping the extruded nanotubes from bundling into haystacks [23].…”

Section: Methodsmentioning

confidence: 99%

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Fabrication of highly ordered anodic aluminium oxide templates on silicon substrates

Yin

Tzolov

Cardimona

et al. 2007

IET Circuits Devices Syst.

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Public reporting burden for this collection of information is estimated to average 1 hour per response, including the time for reviewing instructions, searching existing data sources, gathering and maintaining the data needed, and completing and reviewing this collection of information. Send comments regarding this burden estimate or any other aspect of this collection of information, including suggestions for reducing this burden to Department of Defense, Washington Headquarters Services, Directorate for Information Operations and Reports (0704-0188), 1215 Jefferson Davis Highway, Suite 1204, Arlington, VA 22202-4302. Respondents should be aware that notwithstanding any other provision of law, no person shall be subject to any penalty for failing to comply with a collection of information if it does not display a currently valid OMB control number. PLEASE DO NOT RETURN YOUR FORM TO THE ABOVE ADDRESS. REPORT DATE (DD-MM-YYYY) PERFORMING ORGANIZATION NAME(S) AND ADDRESS(ES) 8. PERFORMING ORGANIZATION REPORT NUMBERBrown University Division of Engineering Providence, RI 02912 SPONSORING / MONITORING AGENCY NAME(S) AND ADDRESS(ES) 10. SPONSOR/MONITOR'S ACRONYM(S)AFRL/VSSS Air Force Research Laboratory* Space Vehicles Directorate The controlled fabrication of highly ordered anodic aluminium oxide (AAO) templates of unprecedented pore uniformity directly on Si, enabled by new advances on two fronts -direct and timed anodisation of a high-purity Al film of unprecedented thickness (50μm) on Si, and anodizing a thin but pre-textured Al film on Si, has been reported. To deposit high-quality and ultra-thick Al on a non-compliant substrate, a prerequisite for obtaining highly ordered pore arrays on Si by self-organisation while retaining a good adhesion, a specially designed process of e-beam evaporation followed by in situ annealing has been deployed. To obtain an AAO template with the same high degree of ordering and uniformity but from a thin Al film, which is not achievable by the self-organisation alone, pre-patterning of the thin Al surface by reactive ion etching using a free-standing AAO mask that was formed in a separate process was performed. The resultant AAO/Si template provides a good platform for integrated growth of nanotube, nanowire or nanodot arrays on Si. Template-assisted growth of carbon nanotubes (CNTs) directly on Si was demonstrated via a chemical vapour deposition method. By controllably removing the AAO barrier layer at the bottom of the pores and partially etching back the AAO top surface, new CNT/Si structures were obtained with potential applications in field emitter, sensors, oscillators and photodetectors. Abstract: The controlled fabrication of highly ordered anodic aluminium oxide (AAO) templates of unprecedented pore uniformity directly on Si, enabled by new advances on two fronts -direct and timed anodisation of a high-purity Al film of unprecedented thickness (50 mm) on Si, and anodising a thin but pre-textured Al film on Si, has been reported. To deposit high-quality and ultrathick Al o...

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Section: Methodsmentioning

confidence: 99%

“…Controllably exposing the CNTs from the AAO matrix follows the same process as described earlier [23]. Using the exposed CNT array as a platform for biosensing applications has been well demonstrated [29].…”

mentioning

confidence: 99%

Fabrication of highly ordered anodic aluminium oxide templates on silicon substrates

Yin

Tzolov

Cardimona

et al. 2007

IET Circuits Devices Syst.

Self Cite

View full text Add to dashboard Cite

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“…As a comparison, two other conventional surface cleaning methods, ion milling and air oxidation were also employed to treat identical samples. For a typical ion milling process, the sample was cleaned in BCl 3 20 sccm and Ar 5 sccm, at Pressure 15 mTorr and Power: 100 W by a RIE system of Trion Minilock II for 15 minutes [16]. For a typical air oxidation, the sample was heated in the air at 650 0 C for 30 min [17].…”

Section: International Journal Of Materials Mechanics and Manufacturmentioning

confidence: 99%

Exposure of Carbon Nanotubes Fabricated by Template-Assisted CVD through a Two-Step Method

Yao¹,

Xu²,

Cen³

et al. 2015

IJMMM

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Abstract-Well aligned carbon nanotubes (CNTs) are highly desirable for various studies and applications. Template-assisted chemical vapor deposition has been widely used. However, post growth surface cleaning to remove the junk carbon on sample surface and expose CNTs still relies on either capital intensive facilities or 'hard to control' processes. In the letter, we report a mechanical polishing method to remove the amorphous carbon layer. Compared to other conventional surface cleaning methods, mechanical polishing is relatively straightforward, much easier to scale up and does not require expensive instruments. Combined with a wet-etching step, highly ordered CNT arrays were reliably obtained. Scanning electron microscopy and atomic force microscopy were employed to investigate the surface morphology and roughness and to optimize the processing conditions.

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“…Because nickel is cytotoxic it must be removed from the tips of the nanotubes to enable long-term cultures directly on the CNT MEAs [3]. This is done using a 40% concentration phosphoric acid etch for 25 minutes [4]. The SOG is relatively unaffected by the phosphoric acid.…”

Section: Mea Fabricationmentioning

confidence: 99%

Monitoring spontaneous electrical activity in cultured neural networks using vertically aligned nanotube arrays

Seger¹,

Asis²,

Wong³

et al. 2008

2008 Digest of the IEEE/LEOS Summer Topical Meetings

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Postgrowth Processing of Carbon Nanotube Arrays—Enabling New Functionalities and Applications

Cited by 20 publications

References 30 publications

Fabrication of highly ordered anodic aluminium oxide templates on silicon substrates

Fabrication of highly ordered anodic aluminium oxide templates on silicon substrates

Exposure of Carbon Nanotubes Fabricated by Template-Assisted CVD through a Two-Step Method

Monitoring spontaneous electrical activity in cultured neural networks using vertically aligned nanotube arrays

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