2016
DOI: 10.1063/1.4972475
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Positive charge trapping phenomenon in n-channel thin-film transistors with amorphous alumina gate insulators

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Cited by 23 publications
(22 citation statements)
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References 56 publications
(74 reference statements)
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“…7 shows V Ch,max and the static threshold voltage shift ∆V Th as a function of V GS,max . The rise of both quantities demonstrates increased charge trapping for higher V GS,max , which is caused by an increased tunneling I G for higher positive V GS [32].…”
Section: A Fitting Of the Experimental Datamentioning
confidence: 93%
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“…7 shows V Ch,max and the static threshold voltage shift ∆V Th as a function of V GS,max . The rise of both quantities demonstrates increased charge trapping for higher V GS,max , which is caused by an increased tunneling I G for higher positive V GS [32].…”
Section: A Fitting Of the Experimental Datamentioning
confidence: 93%
“…The reduction of the SS is caused by simultaneous de-trapping of the positive charge and the semiconductor transition from accumulation to depletion. The material parameters, such as gate dielectric thickness and gate electrode material, influencing the charge trapping/de-trapping behavior and related device physics are investigated in detail in [32]. The output characteristic of the TFT is displayed in …”
Section: Electrical Characteristicsmentioning
confidence: 99%
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“…1a shows the fabrication flow, which is comparable to our previous work [14], [15]. The devices are fabricated on free-standing 50 µm thick Polyimide foil.…”
Section: Device Structure and Fabricationmentioning
confidence: 74%
“…Such hysteretic behavior in the C-V characteristics is usually attributed to the trapping effects, or to be more specific, the counter-clockwise C-V hystereses indicate the existence of positive trapped charges in the interfacial region or in the bulk of the insulator [25]. The hysteresis width (Δ V FB ) extracted from the dual-swept C-V curves for the MIS capacitor S1 and S2 are 0.131 and 0.015 V, respectively.…”
Section: Resultsmentioning
confidence: 99%