Abstract:Abstract-An innovative release method of polymer cantilevers with embedded integrated metal electrodes is presented. The fabrication is based on the lithographic patterning of the electrode layout on a wafer surface, covered by two layers of SU-8 polymer: a 10-m-thick photo-structured layer for the cantilever, and a 200-m-thick layer for the chip body. The releasing method is based on dry etching of a 2-m-thick sacrificial polysilicon layer. Devices with complex electrode layout embedded in free-standing 500-m… Show more
“…For example polymerbased devices are interesting alternatives to silicon, particularly when the polymer materials can be functionalized for enhanced specific material properties (e.g, optical, electrical, and mechanical). Mouaziz et al (2006) proposed the realization of SU-8 cantilevers with an integrated Hall-probe for advanced scanning probe sensing applications. To this purpose an innovative release method of polymer cantilevers with embedded integrated metal electrodes has been employed.…”
Section: Hall Sensorsmentioning
confidence: 99%
“…12. Schematic illustration of the process for SU-8 cantilever with integrated electrodes reported by Mouaziz et al (2006).…”
“…For example polymerbased devices are interesting alternatives to silicon, particularly when the polymer materials can be functionalized for enhanced specific material properties (e.g, optical, electrical, and mechanical). Mouaziz et al (2006) proposed the realization of SU-8 cantilevers with an integrated Hall-probe for advanced scanning probe sensing applications. To this purpose an innovative release method of polymer cantilevers with embedded integrated metal electrodes has been employed.…”
Section: Hall Sensorsmentioning
confidence: 99%
“…12. Schematic illustration of the process for SU-8 cantilever with integrated electrodes reported by Mouaziz et al (2006).…”
“…Polymers have always been useful in various MEMS fabrication processes, usually as a mask or sacrificial layer [3], but with the recent development of polymers with excellent mechanical properties and chemical stability they are increasingly being used as a structural material [4]. Polymeric materials typically have a Young's modulus and density lower than their silicon-based counterparts [5]. This results in cantilevers with high mass [1] and surface stress [6] sensitivity.…”
Section: Introductionmentioning
confidence: 99%
“…Photosensitive polymers have allowed for the integration of electronics directly into the polymer [5,13] and the embedding of ferromagnetic and paramagnetic nanoparticles to form composites [14]. This has lead to a departure from the traditional AFM actuation and sensing method of using piezoelectric stages and optical systems [15].…”
a b s t r a c tIn this paper a new method of fabricating cylindrical resin microcantilevers using the Direct Digital Manufacturing (DDM) technique of Micro-stereolithography (MSL) is described. The method is rapid and commercially viable, allowing the fabrication of atomic force microscope (AFM) cantilevers which exhibit much larger spring constants than those currently commercial available. This allows for experimentation in a force regime orders of magnitude higher than currently possible using the AFM. This makes these cantilevers ideally suited for AFM-based depth sensing indentation. Due to their geometry, the assumptions used in the standard Euler-Bernoulli beam theory usually used to analyse AFM cantilevers may no longer be valid. Therefore approximate analytical solutions based on Timoshenko beam theory have been derived for the stiffness and resonant frequency of these cantilevers. Prototypes of the cantilevers have been fabricated and tested. Results show good agreement between experiment and theory.
“…7 The negative photoresist SU-8 is used for the fabrication of structures with high aspect ratio and has mechanical properties that allow it to be introduced as base material for an increasing number of micromechanical devices. [8][9][10][11][12] In this article, we present the design, fabrication, and characterization of 4PPs based on SU-8 cantilevers. The results obtained on thin metal films are compared to measurements performed with a commercialized macroscale resistivity meter ͑Omnimap RS75, KLA Tencor͒.…”
A microscopic four-point probe ͑4PP͒ for resistivity measurements on thin films was designed and fabricated using the negative photoresist SU-8 as base material. The device consists of four microscopic cantilevers, each of them supporting a probe tip at the extremity. The high flexibility of SU-8 ensures a stable electrical point contact between samples and probe tip with all four electrodes even on rough surfaces. With the presented surface micromachining process, 4PPs with a probe-to-probe spacing of 10-20 m were fabricated. Resistivity measurements on thin Au, Al, and Pt films were performed successfully. The measured sheet resistances differ by less than 5% from those obtained by a commercial macroscopic resistivity meter. Due to the low contact forces ͑F cont Ͻ 10 −4 N͒, the 4PP is suitable to be applied also to fragile materials such as conducting polymers. Here the authors demonstrate the possibility of performing resistivity measurements on 100-nm-thick pentacene ͑C 22 H 14 ͒ films with a sheet resistance R s Ͼ 10 6 ⍀ / ᮀ.
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