Polarization property of light guide surface with bilayered nanostructure

Fabricating bi-layered metallic wire-grid polarizers by nanoimprint and O2 plasma etching

“…For example, one can hardly achieve a mold with a pitch less than 200 nm but sufficient area and life. Both parallel and cross-stacking of the bilayered nanostructure have been demonstrated to possess higher polarization efficiency and extinction ratio without a further reduction of pitch and linewidth of Al wire gratings [8,9]. However, the proposed bi-layered structures were fabricated via e-beam lithography and lift-off process, which makes large-area devices unattainable.…”

Investigation of AlGaN MSM Photodetectors with Low-Temperature AlN Cap and Recess Etched Layers

“…Ultraviolet (UV) photodetectors (PDs) are important devices that can be used in various applications, such as flame detection, astronomy detection, pollution monitoring, and space communications [1]. To date, various types of GaN-based PDs have been reported [2][3][4]. Among them, GaN-based metal-semiconductor-metal photodetectors (MSM-PDs) have attracted much attention.…”