Fabrication of flexible metallic wire grid polarizer using thermal NIL and lift-off processes

Design and Simulation of a Greenhouse FSS Nanofiber Film for Enhancing Agricultural Productivity by Selective Reduction of UV and NIR

“…To validate the results, we compare ours with seven independently reported experimental results by other researchers [25][26][27][28][29][30][31]. In 2017, Xie et al [25] presented a prototype made of aluminum nanofibers (W = 150 nm, H = 90 nm).…”

“…Wu et al [29], Chen et al [30], and Ahn et al [31] built and tested their aluminum nanofiber with different sizes. Wu et al (W = 107 nm and H = 145 nm) tested their prototypes at 635 nm.…”

Fabrication of single‐layer metallic nano‐gratings as polarisers by the combination of nanoimprint lithography and lift‐off method

“…The PMGI with the upper structure was removed by the N‐methyl kelopyrrolidide solution, leaving the bottom metal layer on the substrate. In order to improve the efficiency, an ultrasonic action is frequently used in the lift‐off process [15, 16]. However, higher power and longer time ultrasound has a chance to destroy the structure of the nano‐gratings.…”

“…In order to attain high performance of the transmission characteristic in visible spectrum and a wider testing angle [2], a kind of metallic gratings with hundreds nanometres period is proposed to fulfil the application in the polarised light detection [5][6][7]. Until today, several nano-scale fabrication methods have been introduced in metallic nano-gratings fabrication, such as electron beam lithography [7,8], extreme interference lithography [9,10] and nanoimprint lithography (NIL) [3,[11][12][13][14][15][16].…”

“…Then the pattern transfers into the lower-layer resist by etching technology or other methods, in which the imprint resist is treated as a mask. Different fabrication processes are proposed for the single-layer metallic gratings combining with NIL, which can be summarised into several kinds of schemes: (i) etching the metal layer with a designed mask [3,12]; (ii) removing the upper structure of a bilayer metallic grating to leave the bottom material to form the metallic grating [13][14][15][16] and so on. Although with a uniform metal layer for avoiding the uneven metal deposition on the rugged nano-structure, the direct etching metal process has its own difficulties in etching process such as expensive processing cost and need of appropriate etching mask and so on.…”