“…During the growth of 3C-SiC on silicon, lattice mismatch caused by the difference in lattice constant and thermal misfit due to the differences in thermal expansion coefficient will contribute to large residual stress (Nagasawa and Yagi., 1997, Sun, et al, 2012, Veprek, et al, 2009, Zielinski, et al, 2007, Severino, et al, 2007. This stress can induce a high dislocation density and wafer warpage in device manufacture.…”