2007
DOI: 10.1002/pssc.200675438
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Plasticity and deformation microstructure of 4H‐SiC below the brittle‐to‐ductile transition

Abstract: Compression tests under confining pressure are performed with a Paterson press in order to deform 4H-SiC plastically below the brittle-to-ductile transition temperature. Deformation microstructure in this regime is analysed using conventional and high resolution transmission electron microscopy and is compared with literature. Leading partial dislocations with carbon core and silicon core are observed on basal plane as well as perfect dislocations out of the basal plane. Double stacking faults are evidenced in… Show more

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Cited by 25 publications
(23 citation statements)
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References 14 publications
(17 reference statements)
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“…Indeed, the dislocation dynamics are only known thanks to controversial theoretical and experimental results. Many experiments on the more common polytypes, 3C, 4H and 6H, give the lowest activation energy for silicon core partial dislocations (PDs) [1][2][3][4][5][6], whereas other studies show similar mobility for both carbon and silicon core PDs [7]. Note that the leading PDs were identified using the same technique [weak beam-dark field (WB-DF) imaging].…”
Section: Introductionmentioning
confidence: 98%
See 1 more Smart Citation
“…Indeed, the dislocation dynamics are only known thanks to controversial theoretical and experimental results. Many experiments on the more common polytypes, 3C, 4H and 6H, give the lowest activation energy for silicon core partial dislocations (PDs) [1][2][3][4][5][6], whereas other studies show similar mobility for both carbon and silicon core PDs [7]. Note that the leading PDs were identified using the same technique [weak beam-dark field (WB-DF) imaging].…”
Section: Introductionmentioning
confidence: 98%
“…It concerns the multiplicity of the stacking faults (SFs) created in the brittle regime in highly N-doped 4H-SiC. Indeed, the identified defects consist of single stacking faults (SSFs) [2,4,5], double stacking faults (DSFs) [7] or multiple stacking faults (MSFs) [7,10]. The observed differences are particularly a matter of concern when the stacking is determined by high-resolution transmission electron microscopy (HRTEM).…”
Section: Introductionmentioning
confidence: 98%
“…For higher-strength refractory materials such as SiC, a covalently bonded structural ceramic and a semiconductor, most of the existing literature is focused on the mechanical behavior of bulk crystals at elevated temperatures (T > 673 K) [3][4][5][6][7] as they are expected to be brittle at room-temperature. For example, high-temperature compression and bending of bulk 4H-SiC crystals revealed the existence of partial dislocations on the basal {0 0 0 1} planes, full dislocations out of the basal planes, and stacking faults due to the 4H to 3C transformation [8,9]. Roomtemperature measurements of indentation hardness [10][11][12] of bulk single-crystalline SiC and fracture strengths [13,14] of SiC nanorods and nanowires have helped identify the role of indenter geometry, crystal size and crystal orientation on the mechanical properties of SiC.…”
Section: Introductionmentioning
confidence: 99%
“…On the other hand, Pilyankevich et al (1982Pilyankevich et al ( , 1984 and Maeda et al (1988) attribute the different morphologies of partial dislocations to their Burgers vector. After that, Mussi et al (2007) and Lancin et al (2009) found that C-core partial dislocation could be either straight or zigzagged. Their experimental results showed that the core nature of partial dislocations cannot be deduced from the morphology of the dislocation line.…”
Section: Morphology Of Partial Dislocationsmentioning
confidence: 99%
“…During the growth of 3C-SiC on silicon, lattice mismatch caused by the difference in lattice constant and thermal misfit due to the differences in thermal expansion coefficient will contribute to large residual stress (Nagasawa and Yagi., 1997, Sun, et al, 2012, Veprek, et al, 2009, Zielinski, et al, 2007, Severino, et al, 2007. This stress can induce a high dislocation density and wafer warpage in device manufacture.…”
Section: Introductionmentioning
confidence: 99%