2012
DOI: 10.1364/oe.20.005696
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Plasmonic V-groove waveguides with Bragg grating filters via nanoimprint lithography

Abstract: Abstract:We demonstrate spectral filtering with state-of-the-art Bragg gratings in plasmonic V-groove waveguides fabricated by wafer scale processing based on nanoimprint lithography. Transmission spectra of the devices having 16 grating periods exhibit spectral rejection of the channel plasmon polaritons with 8.2 dB extinction ratio and −3 dB bandwidth of ∆λ = 39.9 nm near telecommunications wavelengths. Near-field scanning optical microscopy measurements verify spectral reflection from the grating structures… Show more

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Cited by 50 publications
(66 citation statements)
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“…Narrow trench structures have been previously identified as excellent candidates for plasmonic waveguides with highly concentrated fields [13][14][15]. Similar to the way in which dielectric cavities can be created from dielectric waveguides with different reflective terminations (e.g.…”
Section: Introductionmentioning
confidence: 99%
“…Narrow trench structures have been previously identified as excellent candidates for plasmonic waveguides with highly concentrated fields [13][14][15]. Similar to the way in which dielectric cavities can be created from dielectric waveguides with different reflective terminations (e.g.…”
Section: Introductionmentioning
confidence: 99%
“…Kristensen et al [72, 73] have exploited a combination of UV-NIL for the fabrication of sharp V-groove structures. The fabricated structures are presented in Fig.…”
Section: Fabricationmentioning
confidence: 99%
“…In this work, we experimentally demonstrate the >50% in-coupling efficiency of V-groove CPPs using freely propagating light directed at normal incidence onto waveguide-termination mirrors. The V-grooves and mirrors are both defined during the same conventional UV-lithography step which, combined with chemical etching of silicon crystallographic planes [4], forms the smooth, V-shaped profiles innately in a wafer-scale procedure. The silicon Vgrooves are tailored by thermal oxidation of the silicon to sharpen the groove angle and ensure the existence of wellconfined CPP modes.…”
Section: Introductionmentioning
confidence: 99%