2009
DOI: 10.1063/1.3160309
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Plasma sheath physics and dose uniformity in enhanced glow discharge plasma immersion ion implantation and deposition

Abstract: Articles you may be interested inImproved ion implant fluence uniformity in hydrogen enhanced glow discharge plasma immersion ion implantation into silicon Rev. Sci. Instrum. 85, 063506 (2014); 10.1063/1.4875982 Theoretical investigation of sheath expansion and implant fluence uniformity in enhanced glow discharge plasma immersion ion implantation Appl. Phys. Lett. 93, 091501 (2008); 10.1063/1.2977962Numerical simulation of metal plasma-immersion ion implantation and deposition on a cone Simulation of sheath d… Show more

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Cited by 4 publications
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“…Furthermore, based on theoretical simulation and experimental data, the distribution of the implanted fluence is more uniform over a large area. [11][12][13] Hence, EGD-PIII is a potential alternative in commercial applications such as the production of silicon-on-insulator substrates. However, we have discovered from our experiments that the discharge and implantation effects when using hydrogen and helium plasmas are not as good as those observed from nitrogen and argon plasmas.…”
Section: Introductionmentioning
confidence: 99%
“…Furthermore, based on theoretical simulation and experimental data, the distribution of the implanted fluence is more uniform over a large area. [11][12][13] Hence, EGD-PIII is a potential alternative in commercial applications such as the production of silicon-on-insulator substrates. However, we have discovered from our experiments that the discharge and implantation effects when using hydrogen and helium plasmas are not as good as those observed from nitrogen and argon plasmas.…”
Section: Introductionmentioning
confidence: 99%