Plasma-Enhanced Vapor Deposition Process for the Modification of Textile Materials

Abstract

Nowadays many techniques are used for the surface modification of fabrics and textiles. Two fundamental techniques based on vacuum deposition are known as chemical vapor deposition CVD and physical vapor deposition PVD . In this chapter, the effect of plasma-enhanced physical and chemical vapor deposition on textile surfaces is investigated and explained.Keywords: Chemical vapor deposition, textile, fabric, modification . IntroductionTextile industries have been experiencing fast development with versatile products for a wide spectrum of applications being developed through technological innovations. The surfaces of textiles offer a platform for functional modifications to meet specific requirements for various applications. Surface modification of textiles gives the textile product the desired properties. Many techniques ranging from conventional wet treatments to biological methods are used for the surface modification of textiles.In recent years, a great attention to the functionalization of textile surfaces has been attracted with the help of new technologies, such as high-energy beam processes, vapor deposition, and nanoparticle coatings.The coupling of electromagnetic power into a process gas volume generates the plasma medium comprising a dynamic mix of ions, electrons, neutrons, photons, free radicals, metastable excited species, and molecular and polymeric fragments.Vapor deposition either physical or chemical is a coating process, where the coating material is condensed from vapor phase, forming a thin film, or modifies the surface of the substrate © 2016 The Author(s). Licensee InTech. This chapter is distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/3.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.by creating functional groups on the surface. Different types of deposition techniques are used to meet this criterion. Most of these techniques, including vacuum deposition, are used to minimize unwanted reaction with the free space and to shape the film composition easily. Two fundamental techniques based on vacuum deposition are known as chemical vapor deposition CVD and physical vapor deposition PVD .In the CVD technique, thin film design is achieved by chemical reaction between precursors. The reaction needs hot substrate or high-temperature medium. Due to the need of gas phase for surface coating, the CVD technique is suitable for large and complex-shaped surfaces. Physical processes such as evaporation and sputtering are used in the PVD technique."y contacting effects of the gases, numerous sputtering methods are used to form plasma. Different surfaces can be coated with deposition flux using PVD methods. To select the deposition method, some parameters are very important, such as thin film material, substrate type, uniformity, and control of the thickness.Conventional finishing techniques applied to textiles dyeing, stain repellence, flame retardance, ...

The Role of Surface Modification Methods for Sustainable Textiles

“…Chemical Vapor Deposition (CVD) is one of the thin film and vapor phase deposition methods [50]. In the CVD method, the gaseous material to be coated is deposited on the surface in the form of a film, powder, or fiber with the help of a carrier gas (e. g., He, Ar, and N 2 ) and chemical reactions such as pyrolysis, hydrolysis, oxidation and reduction [50,51]. It is known that the produced coatings are thinner than 10 micrometers [52].…”

“…There are also different types of CVDs. Among them, some methods are used in textile applications: plasma-enhanced chemical vapor deposition (PECVD) and initiated chemical vapor deposition (ICVD) methods [50,54,55].…”

Untitled

“…Dari kedua teknik tersebut, teknik Plasma CVD lebih banyak diminati. Hal ini karena teknik Plasma CVD memanfaatkan spesies reaktif untuk deposisi lapisan, sehingga memungkinkan penggunaan temperatur rendah [8][9][10][11] dari temperatur yang digunakan pada proses PVD dan CVD standar [12,13]. Selain itu, teknik ini juga memerlukan biaya yang lebih murah dibandingkan dengan PVD, serta dapat digunakan untuk produksi skala industri atau skala besar [14,15].…”

Sustainable Synthesis of Highly Functionalized Activated Carbon using Plasma Technology

“…Plasma sputtered metal doping can induce antibacterial properties on AC [28,102] . It should be noted that there are plasma assisted techniques for metal loading onto CMs such as sputtering, [27–28] atomic layer deposition (ALD), [104–105] and plasma enhanced chemical vapor deposition (PECVD) [106–107] . CMs such as BC can be considered a better soil amendment [108–109] since it is rich with lots of minerals.…”