Plasma Characteristics of Inductively Coupled Plasma Using Dual-Frequency Antennas

Abstract

The chaotic behaviours of the Rydberg hydrogen atom near a metal surface are presented. A numerical comparison of Poincaré surfaces of section with recurrence spectra for a few selected scaled energies indicates the correspondence between classical motion and quantum properties of an excited electron. Both results demonstrate that the scaled energy dominates sensitively the dynamical properties of system. There exists a critical scaled energy εc, for ε < εc, the system is near-integrable, and as the decrease of ε the spectrum is gradually rendered regular and finally turns into a pure Coulomb field situation. On the contrary, if ε > εc, with the increase of ε, the system tends to be non-integrable, the ergodic motion in phase space presages that chaotic motion appears, and more and more electrons are adsorbed on the metal surface, thus the spectrum becomes gradually simple.

Characteristics of a dual‐radio‐frequency cylindrical inductively coupled plasma

“…inductively coupled plasma (ICP) sources, [4][5][6][7] capacitively coupled plasma (CCP) sources, [8,9] electron cyclotron resonance (ECR) sources, [10] and microwave plasma sources, [11] are being extensively investigated by many researchers. [13] Moreover, the wafer quality depends critically on plasma uniformity. [4][5][6][7]12] During plasma processing, desirable plasma characteristics, such as a high plasma density, low electron temperature and plasma potential, and good plasma uniformity are of great importance.…”

“…In order to optimize the plasma characteristics of an ICP source, various methods including changing the antenna shape, [14,15] employing multiple low-inductance antennas, [16] enhancing the discharge by a ferromagnetic core , [3,17,18] and using a DF dual-antenna discharge [6,7,13,[19][20][21] have been proposed. Among these methods, DF technology appears particularly promising.…”

“…Moreover, the plasma uniformity can be improved by adjusting the LF power. [13] Moreover, the wafer quality depends critically on plasma uniformity.In order to optimize the plasma characteristics of an ICP source, various methods including changing the antenna shape, [14,15] employing multiple low-inductance antennas, [16] enhancing the discharge by a ferromagnetic core , [3,17,18] and using a DF dual-antenna discharge [6,7,13,[19][20][21] have been proposed. [1][2][3] Various plasma sources, e.g.…”

Modulations of the plasma uniformity by low frequency sources in a large-area dual frequency inductively coupled plasma based on fluid simulations

“…Therefore, considerable effort has been made on research into the DF ICP source, which consists of two matching coils, and could be used as an effective method to improve the uniformity in large-area ICPs. [13][14][15][16][17][18][19] Mishra et al 13 first investigated the plasma characteristics in a dual planar antenna ICP reactor, with the coil frequencies fixed at 2 MHz and 13.56 MHz, respectively. They observed that the best uniformity could be obtained by adjusting the LF powers when the high frequency power was fixed at 800 W. Subsequently, by using an energy-resolved quadrupole, they measured the time-averaged ion energy distribution (IED) in Ar=CF 4 discharges at various DF powers, and revealed that the DF ICP was an effective tool to tailor the IEDs and therefore affected the etch and deposition profiles.…”

“…15 The results showed that the electron density increased, and the electron temperature and plasma potential decreased with the increasing LF power. In addition, Kim et al 16 reported that the plasma density produced in a DF ICP source was higher than in a SF ICP with the same total RF power. Moreover, Jeong et al 17 inductively coupled discharges with internal-type liner coil and cylindrical coil, respectively.…”