Physics of High-Density Radio Frequency Capacitively Coupled Plasma with Various Electrodes and Its Applications

Ohtsu, Yasunori

doi:10.5772/intechopen.78387

Cited by 5 publications

(5 citation statements)

References 28 publications

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“…microelectronics, semiconductors, material engineering, etc., where low-pressure discharge plasmas have been utilized for a long time with practical levels of industry. For example, in the microelectronics engineering, dry etching processes have been widely applied for more than 30 years for the commercial fabrication of memories [7], where typically, fluorine radicals are generated from fluorocarbon gases in the argon-based low-temperature plasmas like CCP [8,9], ICP [10,11], ECR plasmas [12,13], or others, and applied to material etching out of the substrate. On the other hand, for thin-film deposition processes like photovoltaic-device manufacturing, silicon-based materials are quite often deposited on substrates from the SiH 4 or other siliconcompound gaseous molecules [14,15].…”

Section: Introductionmentioning

confidence: 99%

Optical Emission Spectroscopic (OES) analysis for diagnostics of electron density and temperature in non-equilibrium argon plasma based on collisional-radiative model

Akatsuka

2019

Advances in Physics: X

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This paper describes the use of Optical Emission Spectroscopy (OES) to measure electron densities and temperatures in nonequilibrium plasmas. The ways to interpret relative lineintensities of neutral argon atoms are evaluated based upon a collisional-radiative model including atomic collisional processes. A conversion from an excitation temperature determined from relative line intensities assuming a Boltzmann population distribution to the thermal electron temperature in the electron temperature range 1-4 eV and electron density range 10 10-10 12 cm-3 is given. Procedures to obtain electron temperature T e and density N e of non-equilibrium argon plasma by OES measurement with collisional radiative model.

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Section: Introductionmentioning

confidence: 99%

Optical Emission Spectroscopic (OES) analysis for diagnostics of electron density and temperature in non-equilibrium argon plasma based on collisional-radiative model

Akatsuka

2019

Advances in Physics: X

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“…In the plasma deposition system industry, most non-thermal radio frequency plasma are generated by capacitively coupling two metal electrodes short-distanced placed in the reaction chamber, one of which is connected to a single frequency microwave RF power source (13.56 MHz) and the other of which is grounded (Ohtsu, 2018). Upon electric field appearance in between the electrodes, atoms are ionized in order to release electrons which are accelerated by the RF electric field to produce secondary electrons leading to electron-avalanche due to the exponential field increase (Ohtsu, 2018).…”

Section: Inductively Coupled Plasmamentioning

confidence: 99%

“…Consecutively, an electron-avalanche breakdown will make the gas electrically conductive due to its large number of bind-free electrons and allow perfect surface coating (Ohtsu, 2018). The schematic principle of CCP, which is similar to a conventional capacitor, is presented in Figure 5.…”

Section: Inductively Coupled Plasmamentioning

confidence: 99%

Advanced Development of Sustainable PECVD Semitransparent Photovoltaics: A Review

2021

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Energy is the driving force behind the upcoming industrial revolution, characterized by connected devices and objects that will be perpetually supplied with energy. Moreover, the global massive energy consumption increase requires appropriate measures, such as the development of novel and improved renewable energy technologies for connecting remote areas to the grid. Considering the current prominent market share of unsustainable energy generation sources, inexhaustible and clean solar energy resources offer tremendous opportunities that, if optimally exploited, might considerably help to lessen the ever-growing pressure experienced on the grid nowadays. The R&D drive to develop and produce socio-economically viable solar cell technologies is currently realigning itself to manufacture advanced thin films deposition techniques for Photovoltaic solar cells. Typically, the quest for the wide space needed to deploy PV systems has driven scientists to design multifunctional nanostructured materials for semitransparent solar cells (STSCs) technologies that can fit in available household environmental and architectural spaces. Specifically, Plasma Enhanced Chemical Vapor Deposition (PECVD) technique demonstrated the ability to produce highly transparent coatings with the desired charge carrier mobility. The aim of the present article is to review the latest semi-transparent PV technologies that were impactful during the past decade with special emphasis on PECVD-related technologies. We finally draw some key recommendations for further technological improvements and sustainability.

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“…The use of this method makes it possible to create an ion flow directly in the surface treatment area and excludes the transportation space. However, in such systems, due to the discharge conditions, low ion energy corresponds to low ion current density [5].…”

Section: Introductionmentioning

confidence: 99%

Bombardment of the Surface by a Low-Energy Ion Flow Accelerated in the Near-Surface Layer of the Space Charge

Hrechkо¹,

Babenko²,

Sereda³

et al. 2023

Problems of Atomic Science and Technology

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The paper presents a method for the formation of low-energy ion flow for creation and treatment of functional coatings without radiation damage. Plasma source based in arc discharge with filament cathode creates the primary plasma in the volume of vacuum chamber where the treated sample is placed. The formation of low-energy ion flow takes place in the layer of space charge near the samples surface. The behavior of the ion current density depending on the potential drop in the layer has been studied for various experimental parameters and conditions. The sample surface treatment by low-energy ion flow has been also evaluated.

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Physics of High-Density Radio Frequency Capacitively Coupled Plasma with Various Electrodes and Its Applications

Cited by 5 publications

References 28 publications

Optical Emission Spectroscopic (OES) analysis for diagnostics of electron density and temperature in non-equilibrium argon plasma based on collisional-radiative model

Optical Emission Spectroscopic (OES) analysis for diagnostics of electron density and temperature in non-equilibrium argon plasma based on collisional-radiative model

Advanced Development of Sustainable PECVD Semitransparent Photovoltaics: A Review

Bombardment of the Surface by a Low-Energy Ion Flow Accelerated in the Near-Surface Layer of the Space Charge

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