Advanced Development of Sustainable PECVD Semitransparent Photovoltaics: A Review

Abstract

Energy is the driving force behind the upcoming industrial revolution, characterized by connected devices and objects that will be perpetually supplied with energy. Moreover, the global massive energy consumption increase requires appropriate measures, such as the development of novel and improved renewable energy technologies for connecting remote areas to the grid. Considering the current prominent market share of unsustainable energy generation sources, inexhaustible and clean solar energy resources offer tremendous opportunities that, if optimally exploited, might considerably help to lessen the ever-growing pressure experienced on the grid nowadays. The R&D drive to develop and produce socio-economically viable solar cell technologies is currently realigning itself to manufacture advanced thin films deposition techniques for Photovoltaic solar cells. Typically, the quest for the wide space needed to deploy PV systems has driven scientists to design multifunctional nanostructured materials for semitransparent solar cells (STSCs) technologies that can fit in available household environmental and architectural spaces. Specifically, Plasma Enhanced Chemical Vapor Deposition (PECVD) technique demonstrated the ability to produce highly transparent coatings with the desired charge carrier mobility. The aim of the present article is to review the latest semi-transparent PV technologies that were impactful during the past decade with special emphasis on PECVD-related technologies. We finally draw some key recommendations for further technological improvements and sustainability.

Atmospheric plasma activation and thin film deposition processes for adhesion improvement and corrosion resistance in the automotive industry

“…Functional thin films deposited using plasma processes are commonly used for a wide range of applications from aerospace, automotive, biomedical, microelectronics, packaging, and more recently in renewable energy with the development of solar cells and perovskite coatings. [ 27 ]…”

“…Functional thin films deposited using plasma processes are commonly used for a wide range of applications from aerospace, automotive, biomedical, microelectronics, packaging, and more recently in renewable energy with the development of solar cells and perovskite coatings. [27] Traditionally, PECVD operating at low pressure has been extensively used to deposit functional films via the direct interaction of plasma species and an organic precursor. In recent years, several works have highlighted the possibility to use atmospheric pressure PECVD processes for surface functionalization through the deposition of various coatings by controlling precursor fragmentation in the discharge.…”

Potential application of bismuth oxyiodide (BiOI) when it meets light

“…70 polymer-based solar cells. 135 Hoye et al used NiO x as HTL and ZnO as ETL-capped BiOI absorber layer, while ITO was used as the conducting substrate (bottom electrode) and Al layer as the top electrode to form the so-called all-inorganic solar cells device (Fig. 9(b)).…”

“…For instance, the previous report shows that the BiOI absorber layer could also be combined with the so-called hole/electron transport layer (HTL and ETL, respectively), wherein, in fact, this design is similar to that of organic-based solar cells, especially perovskite and polymer-based solar cells. 135 Hoye et al used NiO x as HTL and ZnO as ETL-capped BiOI absorber layer, while ITO was used as the conducting substrate (bottom electrode) and Al layer as the top electrode to form the so-called all-inorganic solar cells device (Fig. 9(b)).…”

Synthesis of Transparent CuI Thin Films by a Facile Low‐Cost High Pressure (HP)‐PECVD Method at Room Temperature for the Application in Solar Cells

“…In spite of facing a set of challenges, plasma assisted thin film deposition systems receive a lot of attention for the development of thin films that are highly uniform, pinhole‐free along with reduced roughness. However, in order to have thin film properties of newly developed HP‐PECVD deposition system comparable to that of LP‐PECVD methods, a lot of tunings are needed, for instance, electrode geometry, sample injection technique, reactor pressure, source power and frequency because the plasma properties are highly influenced by pressure and operating frequency [31] . It is observed that a number of methods for the film deposition at high pressure employing different types of plasma sources due to their low cost because there is no need of expensive vacuum system along with relevant accessories.…”