2022
DOI: 10.1038/s41598-022-24439-4
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Physics inspired compact modelling of $$\hbox {BiFeO}_3$$ based memristors

Abstract: With the advent of the Internet of Things, nanoelectronic devices or memristors have been the subject of significant interest for use as new hardware security primitives. Among the several available memristors, BiFe$$\mathrm{O}_{3}$$ O 3  (BFO)-based electroforming-free memristors have attracted considerable attention due to their excellent properties, such as long retention time, self-rectification, intrinsic stochas… Show more

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Cited by 8 publications
(2 citation statements)
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References 43 publications
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“…Here, A** values of Ga 2 O 3 and BFMO were taken as 33.7 and 120.2 A cm À2 K À2 , respectively, following the literature. 30,31 For the single BFMO device, the fitted values of the parameters F B1 (n 1 ) and F B2 (n 2 ) were 0.80 eV (1.17) and 0.81 eV (1.13), respectively. F B1 was lower than F B2 in the single BFMO device, making the photogenerated electrons (holes) transfer from the FTO (Au) side to the Au (FTO) side [see Fig.…”
Section: Resultsmentioning
confidence: 99%
“…Here, A** values of Ga 2 O 3 and BFMO were taken as 33.7 and 120.2 A cm À2 K À2 , respectively, following the literature. 30,31 For the single BFMO device, the fitted values of the parameters F B1 (n 1 ) and F B2 (n 2 ) were 0.80 eV (1.17) and 0.81 eV (1.13), respectively. F B1 was lower than F B2 in the single BFMO device, making the photogenerated electrons (holes) transfer from the FTO (Au) side to the Au (FTO) side [see Fig.…”
Section: Resultsmentioning
confidence: 99%
“…Memristors typically exhibit undesirable variations in resistance values and SET and RESET voltages from one device to device (also called D2D or spatial variation) and from one cycle to cycle (also called C2C or temporal variation). 165,166 From the perspective of physical mechanism, the cycle-to-cycle variation originates from the stochastic formation and rupture of conductive filaments. 43 The device-to-device variation stems from the limitations of fabrication techniques, which produce nonideal film morphology and homogeneity, resulting in the different electrical characteristics between memristors.…”
Section: Variationmentioning
confidence: 99%