2016
DOI: 10.1063/1.4972034
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Performance improvement for epitaxially grown SiGe on Si solar cell using a compositionally graded SiGe base

et al.

Abstract: Silicon germanium (SiGe) is a material with high mobility and relatively low bandgap making it an attractive candidate for the bottom subcell in a III-V tandem solar cell grown on silicon (Si) substrate. This paper reports on the performance improvement of an epitaxially grown SiGe on Si solar cell by growing a higher Ge composition SiGe layer in the base. The purpose of growing a higher Ge composition SiGe layer in the base is to improve the light absorption. The first iteration of this structure was an Si0.1… Show more

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Cited by 7 publications
(4 citation statements)
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“…Some characteristics competitive with silicon are the higher carrier mobility and the smaller bandgap, being still fully compatible with complementary metal-oxide-semiconductor (CMOS) technology [2]. Other interesting applications for Ge are in the field of optoelectronics devices like photodetectors [3][4][5][6][7][8][9], photodiodes [4,10], photovoltaics [11][12][13][14][15], since the smaller bandgap compared to Si can allow the absorption of photons with larger wavelengths up to the near-infrared and beyond. In photonic devices the conversion efficiency is strongly limited by high reflectivity at the semiconductor surfaces, strongly affecting photon absorption in the active layer.…”
Section: Introductionmentioning
confidence: 99%
“…Some characteristics competitive with silicon are the higher carrier mobility and the smaller bandgap, being still fully compatible with complementary metal-oxide-semiconductor (CMOS) technology [2]. Other interesting applications for Ge are in the field of optoelectronics devices like photodetectors [3][4][5][6][7][8][9], photodiodes [4,10], photovoltaics [11][12][13][14][15], since the smaller bandgap compared to Si can allow the absorption of photons with larger wavelengths up to the near-infrared and beyond. In photonic devices the conversion efficiency is strongly limited by high reflectivity at the semiconductor surfaces, strongly affecting photon absorption in the active layer.…”
Section: Introductionmentioning
confidence: 99%
“…SiO 2 is the most suitable matrix because of its compatibility with the CMOS technology and because it forms the best interface with Si substrate. These efforts are made with the purpose of improving the optoelectronic devices on Si and enabling the SiGe NCs integration in a large area of applications such as non-volatile memories [18][19][20] , GeSi based high-mobility transistors 21 , photo-MOSFETs 22 , solar cells [23][24][25] , thermoelectric applications 26 and high-performance photodetectors 7,[27][28][29][30] .…”
mentioning
confidence: 99%
“…A compromise is to use active SiGe as the bottom cell and GaAsP as its top cell to implement a bandgap combination close to GaAsP/Si. This GaAsP/SiGe dual-junction device was demonstrated in [23][24][25][26][27][28].…”
Section: Graded Simentioning
confidence: 99%