PECVD of amorphous hydrogenated oxygenated nitrogenated carbon films

Mechanism of Nitrogen Incorporation into Amorphous-CNx Films Formed by Plasma-Enhanced Chemical-Vapor Deposition of the Doublet and Quartet States of the CN Radical

“…Recently, the plasma diagnostics based on the observation of emission spectra have been reported for laser-ablation and radio-frequency (RF) plasmas. [8][9][10][11][12] These reports, however, have only emphasized the mechanism of production of the emissive states; the relationship between the production of these states and the formation of the films has been ambiguous. This ambiguity is due to the complexity of the reaction mechanism, because many types of hydrocarbon free radicals are known to be produced in the above processes.…”

Tailored wettability of plasma polymers made of C–F, C–H, and N–H

“…It is faster than sputtering because the target got covered with a black hydrocarbon film (confirmed by visual observation of the target surface). The film structure fully corresponded to the one obtained from PECVD polymer in acetylene discharge . The IR spectrum contained a variety of hydrocarbon bands: CH (840 cm −1 , 890 cm −1 , and 3,000 cm −1 ), CH 2 /CH 3 (1,374 cm −1 , 1,441 cm −1 , 2,830 cm −1 , 2,870 cm −1 , 2,914 cm −1 , and 2,982 cm −1 ), C═C/C═O (1,605 cm −1 ), and C≡C (2,140 cm −1 and 2,213 cm −1 ).…”

“…The film structure fully corresponded to the one obtained from PECVD polymer in acetylene discharge. [51,52] The IR spectrum contained a variety of F I G U R E 5 The emission spectrum of the discharge in Ar/N 2 :C 2 H 2 with ratios 10/5:5 and zoomed of the emission spectra for Ar/N 2 :C 2 H 2 discharge (left) and N 2 :C 2 H 2 discharge (right) to show emission bands appeared due to the emission of acetylene fragments F I G U R E 6 FTIR spectra of the plasma polymer films depending on the C 2 H 2 content in tertiary Ar/N 2 :C 2 H 2 mixture. ATR, attenuated total reflection; FTIR, Fourier-transform infrared spectroscopy hydrocarbon bands: CH (840 cm −1 , 890 cm −1 , and 3,000 cm −1 ), CH 2 /CH 3 (1,374 cm −1 , 1,441 cm −1 , 2,830 cm −1 , 2,870 cm −1 , 2,914 cm −1 , and 2,982 cm −1 ), C═C/C═O (1,605 cm −1 ), and C≡C (2,140 cm −1 and 2,213 cm −1 ).…”

Hydrogenated-amorphous carbon nitride films formed from the dissociative excitation reaction of CH3CN with the microwave-discharge flow of Ar: Correlation of the [N]/([N]+[C]) ratio with the relative number densities of the CH(A2Δ) and CN(B2Σ+) states

“…Amorphous-carbon nitride (a-CN x ) and hydrogenated a-CN x (a-CN x :H) films have been synthesized by a number of methods based on the physical 1-8 and chemical [9][10][11][12][13][14][15][16][17][18][19] vapor depositions, and the structures and properties of these films have been investigated extensively. They are expected in the current studies for applications to the field emission, 17 photoluminescence, 14 and hydrogen-absorbing 18,19 devices as well as superhard coating materials.…”