2016
DOI: 10.1038/srep38127
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Passivation and characterization of charge defects in ambipolar silicon quantum dots

Abstract: In this Report we show the role of charge defects in the context of the formation of electrostatically defined quantum dots. We introduce a barrier array structure to probe defects at multiple locations in a single device. We measure samples both before and after an annealing process which uses an Al2O3 overlayer, grown by atomic layer deposition. After passivation of the majority of charge defects with annealing we can electrostatically define hole quantum dots up to 180 nm in length. Our ambipolar structures… Show more

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Cited by 22 publications
(32 citation statements)
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References 49 publications
(57 reference statements)
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“…Their very flexible design has enabled single and double quantum dots [6][7][8][9] , spin read-out via Pauli spin blockade [10][11][12][13][14][15] , charge sensing experiments with a quantum point contact 16 and dispersive read-out 17 , single qubits 10,[18][19][20][21] and two-qubit logic gates 22 in quick succession. With the demonstration of these building blocks, the reproducible fabrication of fully gate-tuneable devices receives increased attention 23,24 . The formation of unintentional quantum dots [25][26][27] poses a substantial problem, since they can capacitively couple to the intended quantum dot and disturb both transport and charge sensing measurements.…”
mentioning
confidence: 99%
“…Their very flexible design has enabled single and double quantum dots [6][7][8][9] , spin read-out via Pauli spin blockade [10][11][12][13][14][15] , charge sensing experiments with a quantum point contact 16 and dispersive read-out 17 , single qubits 10,[18][19][20][21] and two-qubit logic gates 22 in quick succession. With the demonstration of these building blocks, the reproducible fabrication of fully gate-tuneable devices receives increased attention 23,24 . The formation of unintentional quantum dots [25][26][27] poses a substantial problem, since they can capacitively couple to the intended quantum dot and disturb both transport and charge sensing measurements.…”
mentioning
confidence: 99%
“…By choosing a mid-gap silicide, ambipolar operation is realized in a simple, highly compact design, as no complementary charge reservoirs are required. So far, ambipolar silicon QDs have only been implemented by integrating separate n-and p-type contacts to the same channel, enlarging the device's footprint [33][34][35][36][37] . The NiSi electrodes are formed by EBL, Ni evaporation, lift-off and low-temperature silicidation annealing at 475 • C for 30 min in an argon ambient.…”
mentioning
confidence: 99%
“…The covering Al 2 O 3 layer allows for annealing without dewetting, because it caps the entire structure and contains hydrogen as described in section II. This process is shown to reduce charge defects to a substantial degree 28,73 .…”
Section: The Si/sio 2 Interfacementioning
confidence: 98%