2002
DOI: 10.1889/1.1830259
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P‐29: Erosion Calculation for Sputtering Cathodes

Abstract: Monte Carlo simulations were performed to examine the plasma in sputter magnetrons. The motion of electrons is traced by using realistic magnetic fields. Ionization of Ar due to collision with electrons is included in the model. The distribution of the ionization density is used to calculate the target erosion profile.

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Cited by 5 publications
(4 citation statements)
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“…It is unlikely that a coupling of the magnetic fields of the two sources leads to this enhancement because of their distance. This effect which is similar to the CCE for a single magnetron was predicted for a dual magnetron and named ‘cross‐magnetron effect’ (CME) by Lopp et al12 They simulated the target erosion of such a system and have found an increased erosion rate at two diagonally opposite corners of the dual magnetron caused by an enhanced ionisation probability of the process gas at these positions. Moreover, we could also show in ITO film deposition experiments that the enhanced charge carrier density at the substrate region changes the process parameters in such a manner that the transparency of the ITO films is improved 8…”
Section: Discussionsupporting
confidence: 62%
“…It is unlikely that a coupling of the magnetic fields of the two sources leads to this enhancement because of their distance. This effect which is similar to the CCE for a single magnetron was predicted for a dual magnetron and named ‘cross‐magnetron effect’ (CME) by Lopp et al12 They simulated the target erosion of such a system and have found an increased erosion rate at two diagonally opposite corners of the dual magnetron caused by an enhanced ionisation probability of the process gas at these positions. Moreover, we could also show in ITO film deposition experiments that the enhanced charge carrier density at the substrate region changes the process parameters in such a manner that the transparency of the ITO films is improved 8…”
Section: Discussionsupporting
confidence: 62%
“…The usual configuration was a Leybold TwinMagi sputtering source consisting of two PK 750 cathodes while an alternative setup with moving magnets (CleanMagi) [10,14] has also been tested. As transparent and conductive ZnO:Al films are only obtained in the unstable transition region of the reactive process, a control loop system was implemented that monitors the state of the discharge by measuring oxygen partial pressure with a E-sensor.…”
Section: Methodsmentioning
confidence: 99%
“…Although the physics embodied in formula (1) is not satisfied, simulations of the erosion profile by retracing HEEs randomly emitted from the target in a magnetic field are reported to yield good results compared with experiment [9,12,13].…”
Section: Basic Programmentioning
confidence: 99%