1997
DOI: 10.1557/proc-469-95
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Oxygen Gettering and Thermal Donor Formation at Post-Implantation Annealing of Hydrogen Implanted Czochralski Silicon

Abstract: The effect of oxygen gettering by buried defect layers at post-implantation annealing of hydrogen implanted Czochralski (Cz) grown silicon has been investigated. Hydrogen ions were implanted with an energy of 180 keV and doses of 2.7.1016cm−2 into p-type Cz and for comparison into p-type float zone (Fz) Si. The samples were annealed at temperatures between 400 °C and 1200 °C in a forming gas ambient and examined by secondary ion mass spectrometry (SIMS) in order to measure the hydrogen and oxygen concentration… Show more

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Cited by 6 publications
(1 citation statement)
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“…In particular, it was demonstrated that a counter doping by such donors of initially p-type CZ Si and in some cases p-type FZ Si and formation of regions around the ion-projected range occurs. [72][73][74][75] Because in the case of ion implantation, interstitials and vacancies are formed and participate in all postimplantation complex-formation processes ͑on postimplantation anneals, for in-stance͒, it is difficult to make some conclusions about the nature of shallow donors, which appear at such conditions. It has to be mentioned in this context that Si interstitials can be involved in the process of the STDH formation.…”
Section: H438mentioning
confidence: 99%
“…In particular, it was demonstrated that a counter doping by such donors of initially p-type CZ Si and in some cases p-type FZ Si and formation of regions around the ion-projected range occurs. [72][73][74][75] Because in the case of ion implantation, interstitials and vacancies are formed and participate in all postimplantation complex-formation processes ͑on postimplantation anneals, for in-stance͒, it is difficult to make some conclusions about the nature of shallow donors, which appear at such conditions. It has to be mentioned in this context that Si interstitials can be involved in the process of the STDH formation.…”
Section: H438mentioning
confidence: 99%