2005
DOI: 10.1063/1.1886274
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Oxygen defect and Si nanocrystal dependent white-light and near-infrared electroluminescence of Si-implanted and plasma-enhanced chemical-vapor deposition-grown Si-rich SiO2

Abstract: Articles you may be interested in N 2 O-grown oxides/ 4 H-SiC (0001), (03 3 ¯ 8) , and (11 2 ¯ 0) interface properties characterized by using ptype gate-controlled diodes Appl.

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Cited by 185 publications
(95 citation statements)
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References 42 publications
(62 reference statements)
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“…With increasing the oxygen flow rate up to 1.2 sccm, the dominant phase in the film transfers into SiO 2 -like. Thus, the Si-related NOV defects would become the dominant luminescent centers in the film, contributing to the enhanced blue light emission [31]. This is consistent with the fact that the blue emission intensity is directly proportional to the SiAOASi bond density.…”
Section: Resultssupporting
confidence: 51%
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“…With increasing the oxygen flow rate up to 1.2 sccm, the dominant phase in the film transfers into SiO 2 -like. Thus, the Si-related NOV defects would become the dominant luminescent centers in the film, contributing to the enhanced blue light emission [31]. This is consistent with the fact that the blue emission intensity is directly proportional to the SiAOASi bond density.…”
Section: Resultssupporting
confidence: 51%
“…In the C-rich SiC x O y films, it is considered that the oxygen may be doped as defect-related luminescent centers such as neutral oxygen vacancy (NOV) due to deviation from perfect stoichiometry [17]. The formation of NOV defects would further give rise to the blue emission via the electronic transition between the singlet ground state and the elevated state (triplet) of the Si-related NOV defect [31,32]. This well explained the weak blue band observed in S1 and S2 as shown in Fig.…”
Section: Resultsmentioning
confidence: 99%
“…Then, we can assume that there is no nitridation effect or any radiative defect formation in the Si-NC/SiO 2 interface for embedded films. This is confirmed by the absence of emission bands related to Si-O defects [23]. It is possible that thermal annealing in nitrogen passivates the non-radiative centers around the Si-NCs, showing only the PL emission from Si-NCs [4,19].…”
Section: Discussionsupporting
confidence: 53%
“…This shift has been associated with the formation of amorphous silicon oxide (a-SiO2) due to spinoidal decomposition [30]. Therefore, the structural units of the SOG, which can be described by the different tetrahedral units SiO4-xSix with n = 0−4, gradually transform into well-defined SiO4 and Si-Si4 tetrahedral structures [23,24]. This transformation, only observed in the coated films, agrees with the TEM observation of the SOG flowing into the Si-NCs layer after thermal annealing.…”
Section: Grazing Incidence X-ray Diffractionmentioning
confidence: 99%
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