Organophosphine/phosphite stabilized disilver(i) methanedisulphonates: synthesis, solid state structures and their potential use as MOCVD precursors

Abstract

New disilver(I) methanedisulphonate complexes [CH(2)(SO(3))(2)Ag(2)·L(n)] (L = PPh(3); n=2, 2a; n=3, 2b; n=4, 2c; n=5, 2d; n=6, 2e; L=P(OEt)(3); n=2, 2f; n=4, 2g; n=6, 2h) were prepared by the reaction of [CH(2)(SO(3))(2)Ag(2)], which could be synthesized from methanedisulphonic acid and Ag(2)CO(3) in water, with triphenylphosphine or triethylphosphite in dichloromethane under a nitrogen atmosphere. The solid state structures of three complexes 2c, 2d and 2f were determined by single X-ray structure analysis. Hot-wall metal organic chemical vapor deposition (MOCVD) experiments were carried out at 395 °C, 420 °C and 450 °C using 2g as precursor for the deposition of silver films, respectively. The silver film with high purity obtained at 420 °C is dense and homogeneous, which is composed of many well isolated, granular particulates spreading all over the substrate surface.

Organophosphine/phosphite‐stabilized silver(I) complexes bearing N‐hydroxysuccinimide ligand: synthesis, solid state structure and their potential use as MOCVD precursors

“…The silver precursors most often used in CVD are diverse inorganic and organometallic complexes, including AgF, [(C 4 F 7 )Ag] n , (β‐diketonato)Ag(PR 3 ), (hfac)Ag(CNMe), and silver carboxylate derivatives . Various organophosphine‐stabilized silver methanesulfonates and silver succinimide have been used as CVD precursors in a number of studies by our previous work. Thus new classes of fluorine‐free silver(I) precursors are highly desirable.…”