2003
DOI: 10.1007/s11664-003-0129-8
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Optimization of pretreatment for liquid-phase deposition of SiO2 on ARTON plastic substrate

Abstract: This study extends our previous work on liquid-phase deposition (LPD) of dense, high-quality, silicon-dioxide (SiO 2) films deposited on Si and GaAs substrates from supersaturated, hexafluorosilicic-acid aqueous at near room temperature. Pretreatment to coat the substrate surface with hydroxyl groups was found to be necessary for rapid and high-quality growth. More recent work has extended the range of LPD SiO2 to plastic. The current paper studies optimal LPD pretreatment of a plastic (ARTON) substrate. It is… Show more

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Cited by 9 publications
(1 citation statement)
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“…First, after the plasma pre-treatment, the increase ratio of COO bonding means that the surface becomes more polar, and more OH radical is developed on the surface, so the surface can react more easily with the solution [11,12]. Second, the surface becomes slightly rough after the ion bombardments by the plasma system.…”
Section: Resultsmentioning
confidence: 99%
“…First, after the plasma pre-treatment, the increase ratio of COO bonding means that the surface becomes more polar, and more OH radical is developed on the surface, so the surface can react more easily with the solution [11,12]. Second, the surface becomes slightly rough after the ion bombardments by the plasma system.…”
Section: Resultsmentioning
confidence: 99%