2015 IEEE/ACM International Conference on Computer-Aided Design (ICCAD) 2015
DOI: 10.1109/iccad.2015.7372646
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Optimization of FinFET-based circuits using a dual gate pitch technique

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Cited by 8 publications
(1 citation statement)
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“…on the V t . In this work, the model used in [34] is adapted for calculating the shift in conduction bandedge potential ∆E c due to time-varying strains in the channel. Changes to the valence band-edge potential ∆E v are evaluated using the model in [25].…”
Section: Sense Transistor Modulementioning
confidence: 99%
“…on the V t . In this work, the model used in [34] is adapted for calculating the shift in conduction bandedge potential ∆E c due to time-varying strains in the channel. Changes to the valence band-edge potential ∆E v are evaluated using the model in [25].…”
Section: Sense Transistor Modulementioning
confidence: 99%