Optimization of Design and Fabrication Processes for Realization of a PDMS-SOG-Silicon DNA Amplification Chip

Bhattacharya, Shantanu; Gao, Yuanfang; Korampally, Venumadhav; Othman, M.T.; Grant, Sheila; Kleiboeker, Steven B.; Gangopadhyay, Keshab; Gangopadhyay, Shubhra

doi:10.1109/jmems.2007.892926

Cited by 25 publications

(8 citation statements)

References 22 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The RMF+BCS equations are solved under the usual assumptions of classical meson fields, time reversal symmetry, no-sea contribution, etc. The details of the calculation may be obtained from Bhattacharya et al [12,13].…”

Section: Methodsmentioning

confidence: 99%

Microscopic calculation of proton capture reactions in the mass 60–80 region and its astrophysical implications

Lahiri¹,

Gangopadhyay²

2011

Eur. Phys. J. A

View full text Add to dashboard Cite

Microscopic optical potentials obtained by folding the DDM3Y interaction with the densities from Relativistic Mean Field approach have been utilized to evaluate S-factors of low-energy (p, γ) reactions in mass 60-80 region and to compare with experiments. The Lagrangian density FSU Gold has been employed. Astrophysical rates for important proton capture reactions have been calculated to study the behaviour of rapid proton nucleosynthesis for waiting point nuclei with mass less than A = 80.

show abstract

Section: Methodsmentioning

confidence: 99%

Microscopic calculation of proton capture reactions in the mass 60–80 region and its astrophysical implications

Lahiri¹,

Gangopadhyay²

2011

Eur. Phys. J. A

View full text Add to dashboard Cite

show abstract

“…Radial densities have been obtained from relativistic mean field (RMF) approach using the FSUGold Lagrangian density [18]. Details of which are given in Ref [19,20]. The target is assumed to be spherical and calculations are done in coordinate space.…”

Section: Model Calculationmentioning

confidence: 99%

Radiative proton capture cross sections in the mass range $40-55$

Chakraborty,

Dutta,

Gangopadhyay

et al. 2016

Preprint

View full text Add to dashboard Cite

Proton capture cross sections in the energy range of astrophysical interest for mass region 40-54 have been calculated in the Hauser-Feshbach formalism with reaction code TALYS1.6. The density dependent M3Y effective nucleon-nucleon interaction folded with target radial matter densities from relativistic mean field approach is used to obtain the semimicroscopic optical potential. A definite normalization of potential well depths has been used over the entire mass region. The (p, γ) rates of some reactions, important in the astrophysical scenario, are calculated using the potential in the relevant mass region.

show abstract

“…1–5 There are various bio-sensing schemes developed which have uniqueness along with some limitations. 6–8 Because of the severe limitations posed by the on-chip capture of optical signals, huge losses in intensity along the path, etc., there is an ample scope of new research in the domains of optical biosensing. 4, 9, 10 This work envisages the development of an epifluorescence microscope on a chip within microscopic channels chemically etched between silicon and surface coated with a low refractive index (~1.1) nanoporous (NPS) silica film.…”

Section: Introductionmentioning

confidence: 99%

Nano-finishing of MEMS-based platforms for optimum optical sensing

Gupta

Sundriyal

Basu

et al. 2019

Journal of Micromanufacturing

Self Cite

View full text Add to dashboard Cite

The surface finish of the microelectromechanical systems substrate, particularly the ones that are deployed in chip-based optofluidic systems, is of utmost importance, and the overall surface finish helps in preventing light scattering and associated losses. The proposed system is made up of a microchannel with a coating on its interior which acts as a cladding layer and possesses an air-like refractive index. The water-based solutions with refractive indices higher than the coating, when confined within such channels, act as waveguides with a refractive index difference which would allow grazing incidence at the solution film interface. The microchannel is fabricated over a piece of Si along <100> direction with the help of lithography and wet etching technique. After wet chemical etching of silicon, multiple pyramidal hillocks with overall large surface roughness is observed which are not appropriate for loss-free light transmission and cause various optical losses. So the overall optimization of surface roughness created by the etching processes is critical from an optical standpoint. Roughness in the microchannel surface mainly arises due to wet etching through tetra methyl alcohol, potassium hydroxide, potassium ferricyanide and isopropyl alcohol. In this work, we have obtained surface finish upto ~1.33 nm at an etch rate of 141 nm/min which is obtained by tweaking the composition of the participating reagents in the etchants and also the etching temperature. The surface roughness obtained is quite small in comparison to the wavelength range of the visible spectrum and thus losses were greatly avoided. The low refractive index films over silicon substrate were characterized by field emission scanning electron microscopy, energy dispersive analysis of X-ray, atomic force microscopy, 3D optical profilometry and ellipsometry. The transmission results show that transmission loss was reduced by 27.42% for the coated samples with 33 nm surface roughness as compared to surface with 250 nm roughness.

show abstract

Optimization of Design and Fabrication Processes for Realization of a PDMS-SOG-Silicon DNA Amplification Chip

Cited by 25 publications

References 22 publications

Microscopic calculation of proton capture reactions in the mass 60–80 region and its astrophysical implications

Microscopic calculation of proton capture reactions in the mass 60–80 region and its astrophysical implications

Radiative proton capture cross sections in the mass range $40-55$

Nano-finishing of MEMS-based platforms for optimum optical sensing

Contact Info

Product

Resources

About