2020
DOI: 10.1016/j.mssp.2019.104704
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Optical, water splitting and wettability of titanium nitride/titanium oxynitride bilayer films for hydrogen generation and solar cells applications

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Cited by 43 publications
(26 citation statements)
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“…The deconvolution of the broadband peak in the XRD pattern of TiN/TiO 2 exhibits the overlapping of two diffraction peaks: (101) peak of anatase-TiO 2 (JCPDS 21-1272) and the adjacent (111) peak of TiN (JCPDS 38-1420). Otherwise, the deposition of ultra-thin TiN film using DC sputtering on TiO 2 does not create any phase change in the XRD pattern [ 33 ]. From the XRD of TiN/TiO 2 and the observed peaks for the anatase TIO 2 , it can be concluded that the TiO 2 layer was crystalline with preferred growth orientation alongside the (101) direction.…”
Section: Resultsmentioning
confidence: 99%
“…The deconvolution of the broadband peak in the XRD pattern of TiN/TiO 2 exhibits the overlapping of two diffraction peaks: (101) peak of anatase-TiO 2 (JCPDS 21-1272) and the adjacent (111) peak of TiN (JCPDS 38-1420). Otherwise, the deposition of ultra-thin TiN film using DC sputtering on TiO 2 does not create any phase change in the XRD pattern [ 33 ]. From the XRD of TiN/TiO 2 and the observed peaks for the anatase TIO 2 , it can be concluded that the TiO 2 layer was crystalline with preferred growth orientation alongside the (101) direction.…”
Section: Resultsmentioning
confidence: 99%
“…After theoretical analysis, it was confirmed that enhanced HER activity of FeOOH@Co 4 N occurred because of greater electronic interaction between Co 4 N and FeOOH, and hence led to increased HER kinetics. The following Figure 9 shows the polarization curve of HER FeOOH@Co 4 N. Mohamed et al (2020) synthesized TiN/TiO x N y bilayer films using D.C reactive magnetron sputtering. Li et al (2015) reported that in a bilayer film a higher TiN layer causes a more negative flat -band value.…”
Section: Water Splittingmentioning
confidence: 99%
“…6,7 The preparations of the high-quality materials occurred using many different techniques such as magnetron sputtering, chemical bath deposition, spray pyrolysis, sol-gel, chemical vapor deposition, laser pulsed, and atomic layer deposition. [8][9][10][11][12][13][14][15][16][17] From the preparation methods, the prepared nanomaterials accepted different chemical or physical properties that qualify their applications in optoelectronic devices. 18 From the high technology field, most electronic devices have optoelectronic applications such as aircrafts, smart windows, cameras, light controller, and spectrophotometers.…”
Section: Introductionmentioning
confidence: 99%