“…The 0.3 lm SiO 2 cladding layer was realized on the substrate by thermal oxidation, then the core on the top consisted of a 1.6 lm thick a-Si:H layer obtained by plasma enhanced chemical vapour deposition (PECVD). Because the presence of impurities can influence the deep traps density and the intensity of the PA phenomenon [5,8], differently doped a-Si:H cores have been deposited from silane (SiH 4 ) and diborane (B 2 H 6 ) gas mixture, at temperature and pressure of 170°C and 200 m Torr, respectively, with 3 h 15 min deposition time. Different gas phase doping ratios were used to deposit the cores of waveguides, as summarized in Table 1.…”