Optical properties of rare earth-doped TiO2 anatase and rutile thin films grown by pulsed-laser deposition

Structural, morphological, optical and photocatalytic properties of Gd-doped TiO2 films

“…However, in the practical application, there are numerous advantages in using a photocatalyst as a film or layer to be immobilized onto a solid support. Many methods can be used to prepare thin films, such as sol-gel process [23], pulsed laser deposition [24], electrochemistry process [25], hydrothermal method [26], magnetron sputtering [27,28], etc. Among these methods, the sputtering method is a very useful technique because it provides large area coatings with good thickness uniformity, high film quality and strong mechanical durability.…”

Unique Pulsed-Laser Deposition Production of Anatase and Rutile TiO<sub>2</sub> on Al<sub>2</sub>O<sub>3</sub>

“…However, when searching this literature for PLD growth protocols for specific crystallographic phases, a clear pattern emerged: researchers tended to favor using a pure titanium target with a silicon substrate to grow anatase titania (see, e.g., Di Fonzo et al [4], Luca et al [20], and Gÿorgy et al [21]), whereas typical growth protocols for rutile thin films used rutile titania targets and either glass or silicon substrates (see, e.g., Gÿorgy et al [21], Dzibrou et al [24], and Long et al [25]). Kitazawa et al [26], Luttrell et al [5] and Le Boulbar et al [27] used c-cut Al 2 O 3 as their substrate for growing rutile TiO 2 , but in every instance in which researchers used Al 2 O 3 as a substrate, it was switched for LaAlO 3 when they attempted to produce anatase TiO 2 . According to Luca et al [20], Janisch et al [29], and references therein, growing TiO 2 on Al 2 O 3 leads to either rutile, mixed-phase films or brookite films.…”

Comparison of Pure and Doped TiO2 Thin Films Prepared by Sol-Gel Spin-Coating Method

“…Sol-gel is one of these methods [4][5][6][7][8][9][10][11][12]. Besides sol-gel method there are many different ways for producing thin films, such as electron beam evaporation, metalorganic chemical vapor deposition method, atomic layer deposition, RF magnetron sputtering, thermionic vacuum arc and pulsed laser deposition [13,14].…”