2010
DOI: 10.1016/j.surfcoat.2009.11.007
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Optical properties of nanometric TiO2 clusters deposited on thin films by high pressure sputtering

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Cited by 8 publications
(1 citation statement)
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“…To avoid these problems, TiO 2 thin films have recently been used. These films were prepared by several methods including thermal [17] or anodic [18] oxidation of titanium, sol-gel [19][20][21][22], spray deposition [23], chemical vapor deposition [24][25][26][27], plasma-enhanced chemical vapor deposition, [28] electron beam evaporation [29] and reactive sputtering [30,31]. Among these methods, sputter deposition techniques are widely utilized to obtain uniform and dense TiO 2 thin films with well-controlled stoichiometry [32].…”
Section: Introductionmentioning
confidence: 99%
“…To avoid these problems, TiO 2 thin films have recently been used. These films were prepared by several methods including thermal [17] or anodic [18] oxidation of titanium, sol-gel [19][20][21][22], spray deposition [23], chemical vapor deposition [24][25][26][27], plasma-enhanced chemical vapor deposition, [28] electron beam evaporation [29] and reactive sputtering [30,31]. Among these methods, sputter deposition techniques are widely utilized to obtain uniform and dense TiO 2 thin films with well-controlled stoichiometry [32].…”
Section: Introductionmentioning
confidence: 99%