2010
DOI: 10.1016/j.jcrysgro.2010.04.013
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Optical probing of low-pressure solution grown GaN crystal properties

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Cited by 5 publications
(4 citation statements)
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“…10) Previous studies of self-nucleated crystals indicate that these crystals have an X-ray rocking curve full width at half maximum (FWHM) similar to that of Ammonothermal crystals, record small FWHM of the first-order allowed optical phonons, and relatively low room temperature (RT) free carrier concentrations. 11,12) The samples used in this experiment were grown in a custom-designed reactor incorporated in a vertical tube furnace. A multi-component solvent was employed to dissolve the GaN source and subsequently grow single crystal GaN from the solution.…”
mentioning
confidence: 99%
“…10) Previous studies of self-nucleated crystals indicate that these crystals have an X-ray rocking curve full width at half maximum (FWHM) similar to that of Ammonothermal crystals, record small FWHM of the first-order allowed optical phonons, and relatively low room temperature (RT) free carrier concentrations. 11,12) The samples used in this experiment were grown in a custom-designed reactor incorporated in a vertical tube furnace. A multi-component solvent was employed to dissolve the GaN source and subsequently grow single crystal GaN from the solution.…”
mentioning
confidence: 99%
“…9 GaN typically has a peak near 365 nm due to a band-to-band transition, and a small peak near 382 nm due to recombination of an electron in the conduction band with a hole bound to an acceptor. 10 Two broad yellow peaks near 482 nm and 525 nm caused by carbon-related defects are also observed. 11 The main peak of CdS, WS 2 , 13 and CsPbBr 3 , 14 at 508 nm, 630 nm, and 523 nm, respectively, is due to exciton recombination.…”
Section: Simulated Pl Spectramentioning
confidence: 97%
“…Figure 6. PL spectra of GaN from Balkas et al,26 Chen et al, Chakrapani et al,28 and Freitas et al10 …”
mentioning
confidence: 99%
“…Kawamura et al [559,560] describe a two-stage dislocation reduction process in Na flux solution growth of 2-mm thick GaN layers, yielding dislocation densities as low as 10 2 cm -2 . Freitas et al [561] concluded that reduced residual impurity levels could be achieved in solution growth of GaN from Ga-Li melts using nitrogen pressures of 0.23-0.25 MPa and growth temperatures of 760-800 C. Masumoto et al [562] studied the effect of Ca and Li additives to Na melts in GaN LPE on GaN/sapphire substrates with growth temperatures of 850-890 C, indicating improved quality of crystal transparency and surface smoothness. Further, Ca, Li, and oxygen impurities in GaN were decreased by using higher growth temperatures.…”
Section: Iii-v Nitride Lpementioning
confidence: 99%