Optical parameters induced by phase transformation in RF magnetron sputtered TiO2 nanostructured thin films

Nair, Prabitha B.; Justinvictor, V. B.; Daniel, Georgi P.; Joy, K.; Raju, K. C. James; Kumar, David D.; Thomas, P.V.

doi:10.1016/j.pnsc.2014.05.010

Cited by 65 publications

(20 citation statements)

References 37 publications

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“…Generally, singly ionised charge vacancy acts as a visible luminescent center. 21 PL emission peak at 470 nm was observed due to the oxygen vacancy in TiO 2 .…”

Section: Photoluminescence Studymentioning

confidence: 96%

“…This phenomenon increases the oxygen vacancy emission. 21 Then, as the background oxygen pressure was increased during the thin film deposition, the oxygen vacancies decreased. Therefore, in the crystalline films, the ratio of (P 3 /P 1 ) and (P 2 /P 1 ) decreases with the increasing of the oxygen pressure can be attributed to the decrease of oxygen vacancy concentration.…”

Section: Photoluminescence Studymentioning

confidence: 99%

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Oxygen partial pressure induced effects on the microstructure and the luminescence properties of pulsed laser deposited TiO2 thin films

et al. 2017

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In this work, the influence of oxygen partial pressure on structural, morphological, and optical properties of TiO2 thin films grown on fused quartz substrate at different oxygen partial pressure by pulsed laser deposition were examined. X-Ray diffraction (XRD) patterns show the formation of TiO2 anatase phase deposited at high oxygen pressure. Atomic Force Microscopy (AFM) reveals that surface roughness of the films increases with oxygen pressure. Variation of surface morphology of films with increasing oxygen partial pressure was studied by AFM. It is observed that energy band gap of the films increases from 3.27 eV to 3.52 eV with the increase of oxygen pressure and is attributed to the decrease of oxygen defects. TiO2 thin films exhibited blue emission under the excitation of 320 nm wavelength. De-convoluted photoluminescence (PL) peaks showed that defect states are responsible for visible emission in TiO2 thin films. The intensity of PL emission associated with oxygen vacancies decreases with increasing oxygen pressure. Photometric characteristic analysis shows that the films deposited 1x10-4 mbar oxygen pressure exhibited intense blue emission with high luminescence efficacy of radiation.

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“…Generally, singly ionised charge vacancy acts as a visible luminescent center. 21 PL emission peak at 470 nm was observed due to the oxygen vacancy in TiO 2 .…”

Section: Photoluminescence Studymentioning

confidence: 96%

Section: Photoluminescence Studymentioning

confidence: 99%

Oxygen partial pressure induced effects on the microstructure and the luminescence properties of pulsed laser deposited TiO2 thin films

et al. 2017

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“…In the thin film industry, the rutile and anatase phases are the most commonly used, each of them having different advantages over the other. TiO 2 has a refractive index of n ≈ 1.7-2.7 [1,14], rutile having a higher n (~2.7) than anatase [15]. Rutile also presents a higher dielectric constant, sometimes reaching 63 [16], compared to anatase, which has a dielectric constant of 6-19 [17].…”

Section: Introductionmentioning

confidence: 99%

“…Rutile also presents a higher dielectric constant, sometimes reaching 63 [16], compared to anatase, which has a dielectric constant of 6-19 [17]. However, anatase has a wider optical band gap than rutile (3.2 eV vs. 3.0 eV, respectively) [14]. In this context, rutile is a promising candidate for filters, dielectric mirrors of lasers and optical anti-reflective thin layers [18], while anatase is more desired in photocatalytic applications [13,[19][20][21].…”

Section: Introductionmentioning

confidence: 99%

RF Magnetron Sputtering Deposition of TiO2 Thin Films in a Small Continuous Oxygen Flow Rate

et al. 2019

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Rutile titanium oxide (TiO 2 ) thin films require more energy to crystallize than the anatase phase of TiO 2 . It is a prime candidate for micro-optoelectronics and is usually obtained either by high substrate temperature, applying a substrate bias, pulsed gas flow to modify the pressure, or ex situ annealing. In the present work, we managed to obtain high enough energy at the substrate in order for the particles to form rutile TiO 2 at room temperature without any intentional substrate bias in a continuous gas flow. The rutile TiO 2 thin films were deposited by a reactive radiofrequency magnetron sputtering system from a titanium target, in an argon/oxygen gas mixture. Investigations regarding the film's structure and morphology were performed by X-ray diffraction (XRD), X-ray reflectivity (XRR), scanning electron microscopy (SEM) and energy-dispersive X-ray spectroscopy (EDAX), while the optical properties were investigated by means of ellipsometry.

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“…Observa-se uma diminuição no valor do band gap óptico com aumento da temperatura de recozimento das amostras (Nair, et al, 2014).…”

Section: Filmes Finos De óXido De Titâniounclassified

Produção e caracterização de filmes finos de TiO<sub>2</sub>

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Gostaria de agradecer a todos que fizeram parte direta ou indiretamente para a realização desse trabalho. Ao meu Orientador Chubaci, pela paciência, pelo carinho e por todo o apoio durante essa longa jornada, desde os idos tempos da graduação. Ao Professor Ronaldo Mansano pela participação na produção das amostras no sistema de RF magnetron sputtering. À professora Márcia Fantini e ao Antônio Carlos, por todo a atenção e ajuda. Aos funcionários do LAMFI, pelo apoio técnico em especial ao Cleber, por toda contribuição e aprendizado que me ofereceu. Aos meus amigos de tantos anos de IFUSP Renato, Henrique, Artur, Danilo, Thales e tantos outros que não caberiam aqui, que me acompanharam por toda essa trajetória dando todo apoio, sem vocês nada disso teria sido possível. Às minhas amigas Flávia, Emanuelle, Karolyne, por todo apoio, torcida e anos de amizade. A todos aquelas pessoas que a vida me trouxe, não por acaso, sem vocês eu não teria chegado onde cheguei. Às tantas outras pessoas que não citei, agradecerei pessoalmente. Ao CNPq pelo apoio financeiro.

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Optical parameters induced by phase transformation in RF magnetron sputtered TiO2 nanostructured thin films

Abstract: truefalse2016-03-16T23:02:09

Cited by 65 publications

References 37 publications

Oxygen partial pressure induced effects on the microstructure and the luminescence properties of pulsed laser deposited TiO2 thin films

Oxygen partial pressure induced effects on the microstructure and the luminescence properties of pulsed laser deposited TiO2 thin films

RF Magnetron Sputtering Deposition of TiO2 Thin Films in a Small Continuous Oxygen Flow Rate

Produção e caracterização de filmes finos de TiO<sub>2</sub>

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