2003
DOI: 10.1016/s0038-1098(03)00565-9
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Optical parameters in ZnO nanocrystalline textured films grow on p-InP (100) substrates

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Cited by 22 publications
(10 citation statements)
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“…[ 10,11 ] It is used in several devices such as photovoltaic cells, [ 12 ] electroluminescent devices, [ 13 ] photodetectors, [ 14 ] and photosensors. [ 15 ] Various morphologies of ZnO nanostructures like nanotubes, nanorods (NRs), nanowires, and nanoparticles were developed by several techniques, such as sol–gel, [ 16 ] successive ionic layer adsorption and reaction (SILAR), [ 17 ] chemical bath deposition (CBD), [ 18 ] pulsed laser deposition, [ 19 ] spray pyrolysis, [ 20 ] reactive magnetron sputtering, [ 21 ] electrodeposition, [ 22,23 ] etc. Compared with other elaboration processes, electrodeposition is an adequate technique for the synthesis of ZnO nanostructure, because of its low cost, its simplicity, low temperature and atmospheric pressure conditions, and the very high quality of the deposited films.…”
Section: Introductionmentioning
confidence: 99%
“…[ 10,11 ] It is used in several devices such as photovoltaic cells, [ 12 ] electroluminescent devices, [ 13 ] photodetectors, [ 14 ] and photosensors. [ 15 ] Various morphologies of ZnO nanostructures like nanotubes, nanorods (NRs), nanowires, and nanoparticles were developed by several techniques, such as sol–gel, [ 16 ] successive ionic layer adsorption and reaction (SILAR), [ 17 ] chemical bath deposition (CBD), [ 18 ] pulsed laser deposition, [ 19 ] spray pyrolysis, [ 20 ] reactive magnetron sputtering, [ 21 ] electrodeposition, [ 22,23 ] etc. Compared with other elaboration processes, electrodeposition is an adequate technique for the synthesis of ZnO nanostructure, because of its low cost, its simplicity, low temperature and atmospheric pressure conditions, and the very high quality of the deposited films.…”
Section: Introductionmentioning
confidence: 99%
“…To date, there have been many reports on lowdimensional ZnO growth by several techniques including molecular beam epitaxy [16], metal organic chemical vapor deposition [17], RFsputtering [18], and pulsed laser deposition [19]. To our knowledge, the growth and optical characterization of ZnO whiskers grown by the hot wall epitaxy (HWE) method, which can be controlled independently of the source, wall, and substrate temperature, has not yet been reported.…”
Section: Introductionmentioning
confidence: 99%
“…ZnO thin films have been prepared by a wide variety of techniques such as pulsed laser deposition [7], sputtering [8], and electrodeposition [9][10][11][12][13]. In particular, the electrodeposition method has advantages over other processes because of its simplicity, low equipment cost and the possibility in making large area thin films.…”
Section: Introductionmentioning
confidence: 99%