Optical and Structural Properties of Oxidized Titanium Films

Abstract

This paper is concerned with the properties of evaporated titanium films and their oxides. Thin films of titanium (100 to 500 Å) were evaporated at pressures below 5 × 10−9 Torr and subsequently oxidized. Amorphous quartz and single crystals of alkalai halides and CaF2 were used as substrates. Evaporations were performed at substrate temperatures in a range from 25 ° to 500 °C. The structures of the films were investigated prior to, during, and following oxidation by employing reflection electron diffraction. The uv transmission spectra of the oxidized films were taken after removing them from the vacuum chamber.