Opacity of neutral and low ion stages of Sn at the wavelength 13.5 nm used in extreme-ultraviolet lithography

Lysaght, Michael; Kilbane, Deirdre; Murphy, Nicola; Cummings, A.; Dunne, Padraig; O'Sullivan, Gerry

doi:10.1103/physreva.72.014502

Cited by 39 publications

(29 citation statements)

References 34 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…In Fig. 4a, the absorption resonance lines are marked indicating that plasma in this spectral range is optically thick and emission is suppressed by absorption [39,40]. In Fig.…”

Section: Measurements With the Grazing Incidence Spectrographmentioning

confidence: 99%

Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target

et al. 2010

View full text Add to dashboard Cite

The paper describes a debris-free, efficient laserproduced plasma source emitting EUV radiation. The source is based on a double-stream Xe/He gas-puff. Its properties and spectroscopic signatures are characterized and discussed. The spatio-spectral features of the EUV emission are investigated. We show a large body of results related to the intensity and brightness of the EUV emission, its spatial, temporal, and angular behavior and the effect of the repetition rate as well. A conversion efficiency of laser energy into EUV in-band energy at 13.5 nm of 0.42% has been gained. The electron temperature and electron density of the source were estimated by means of a novel method using the FLY code. The experimental data and the Hullac code calculations are compared and discussed. The source is well suited for EUV metrology purposes. The potential of the source for R. Rakowski ( ) ·

show abstract

“…In Fig. 4a, the absorption resonance lines are marked indicating that plasma in this spectral range is optically thick and emission is suppressed by absorption [39,40]. In Fig.…”

Section: Measurements With the Grazing Incidence Spectrographmentioning

confidence: 99%

Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target

et al. 2010

View full text Add to dashboard Cite

show abstract

“…To obtain high conversion efficiency (CE) from incident laser energy to output EUV energy, the plasma size should be controlled to attain an appropriate optical depth, i.e., the product of the mass absorption coefficient and area density of the plasma for 13.5 nm light. Recently the opacities of neutral through four-times ionized Sn have been reported [8]. These opacities are quite important for investigating EUV radiation transport in the lowtemperature plasma periphery.…”

mentioning

confidence: 99%

Opacity Effect on Extreme Ultraviolet Radiation from Laser-Produced Tin Plasmas

et al. 2005

View full text Add to dashboard Cite

“…In addition, as was the case with the development of Sn as a source of EUV emission at 13.5 nm, information on the photoabsorption cross sections for the low ion stages of Gd, found in the periphery of the plasma, need to be obtained to reliably model the spectra obtained in Fig. 2 for the 10 ns laser pulse duration [20]. In summary, we have demonstrated the effect of viewing angle on the spectral emission of a planar Gd target in the 6.7-nm spectral region for two target orientations with respect to the laser irradiation direction.…”

mentioning

confidence: 99%

The effect of viewing angle on the spectral behavior of a Gd plasma source near 6.7 nm

O’Gorman

Ôtsuka

Yugami

et al. 2012

Applied Physics Letters

View full text Add to dashboard Cite

We have demonstrated the effect of viewing angle on the extreme ultraviolet (EUV) emission spectra of gadolinium (Gd) near 6.7 nm. The spectra are shown to have a strong dependence on viewing angle when produced with a laser pulse duration of 10 ns, which may be attributed to absorption by low ion stages of Gd and an angular variation in the ion distribution. Absorption effects are less pronounced at a 150-ps pulse duration due to reduced opacity resulting from plasma expansion. Thus for evaluating source intensity, it is necessary to allow for variation with both viewing angle and target orientation.

show abstract

Opacity of neutral and low ion stages of Sn at the wavelength 13.5 nm used in extreme-ultraviolet lithography

Cited by 39 publications

References 34 publications

Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target

Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target

Opacity Effect on Extreme Ultraviolet Radiation from Laser-Produced Tin Plasmas

The effect of viewing angle on the spectral behavior of a Gd plasma source near 6.7 nm

Contact Info

Product

Resources

About