2013
DOI: 10.1109/jdt.2012.2204858
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On the Effect of Step-Doped Quantum Barriers in InGaN/GaN Light Emitting Diodes

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Cited by 52 publications
(54 citation statements)
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“…[6][7][8]11 Moreover, for GaN/AlGaN/GaN heterostructure [refer to the inset of Fig. 6], the AlGaN layer is subject to the tensile strain, and thus, the piezoelectric field polarization and the spontaneous polarization are both oriented opposite to the growth orientation.…”
Section: -2 Zhang Et Almentioning
confidence: 99%
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“…[6][7][8]11 Moreover, for GaN/AlGaN/GaN heterostructure [refer to the inset of Fig. 6], the AlGaN layer is subject to the tensile strain, and thus, the piezoelectric field polarization and the spontaneous polarization are both oriented opposite to the growth orientation.…”
Section: -2 Zhang Et Almentioning
confidence: 99%
“…[1][2][3] The device performance is, however, still limited by Auger recombination, 4,5 charge separation, 6-9 current crowding, [10][11][12] insufficient hole injection, 9,[13][14][15][16][17][18] and electron overflow from the MQW active region. [19][20][21][22] In order to address these issues, a staggered quantum well architecture and also InGaN/GaN MQWs with Si-step-doped quantum barriers have been proposed to screen the quantum confined Stark effect (QCSE) and increase the spatial overlap of electron-hole wave functions, [7][8][9] while an improved current spreading can be obtained either by making the p-type layer more resistive or the p-contact layer more conductive. 10,11 Additionally, an improved crystal quality is also essential for improving the device efficiency.…”
mentioning
confidence: 99%
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“…12 Apart from the above methods, the polarization induced electric field within the quantum wells can be screened by Si doping the quantum barriers. 13 According to the report by Zhang et al, 13 in addition to the electrons released by those Si dopants in the quantum barriers, the ionized Si dopants are also essential in screening the polarization induced electric field within the quantum wells, and thus the QCSE. The drawback of a high Si doping level in the quantum barriers is that it will block the hole injection across the whole active region.…”
mentioning
confidence: 99%
“…The drawback of a high Si doping level in the quantum barriers is that it will block the hole injection across the whole active region. 13 Therefore, it will be useful to replace those ionized dopants with any other electrically charged particles which can avoid the hole blocking effect. Hence, in this work, we have proposed the In y Ga 1Ày N/ In x Ga 1Àx N quantum well/quantum barrier architecture, in which the InN composition x in the quantum barrier is graded along the growth direction, so that the polarization induced bulk charges are generated to replace the ionized dopants in the quantum barriers, and have an excellent screening effect on the polarization induced electric field in the quantum wells.…”
mentioning
confidence: 99%