2014
DOI: 10.1002/admi.201400281
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Correlative High‐Resolution Mapping of Strain and Charge Density in a Strained Piezoelectric Multilayer

Abstract: A key to strain engineering of piezoelectric semiconductor devices is the quantitative assessment of the strain‐charge relationship. This is particularly demanding in current InGaN/GaN‐based light‐emitting diode (LED) designs as piezoelectric effects are known to degrade the device performance. Using the state‐of‐the‐art inline electron holography, we have obtained fully quantitative maps of the two‐dimensional strain tensor and total charge density in conventional blue LEDs and correlated these with sub‐nanom… Show more

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Cited by 20 publications
(9 citation statements)
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“…Figure a shows the simulated intensity distribution at the diffraction plane, and thus at the segmented area detector, when a 300 kV electron probe passes 0.2 Å to the left of a gallium atomic column in a 1.6 nm thick GaN crystal oriented along the [112̅ 0] direction. GaN is a common material in a wide variety of optoelectronic devices, such as blue light-emitting diodes, and has been extensively studied using DPC-STEM at nanometer resolutions, exploring the possibility of detecting the piezoelectric fields in optoelectronic devices. The probe intensity at the diffraction plane is shifted toward the Ga column due to the interaction between the incident electrons and the atomic electric field: the direction of deflection shows that the attractive force exerted on the incident electrons by the nucleus is dominant, although it is moderated by the screening electrons. The simulation exposes how the traditional picture of a rigid deflection of the probe due to the atomic electric field is only a simplification of the real effects, as described in recent experimental and theoretical , reports.…”
Section: Resultsmentioning
confidence: 99%
“…Figure a shows the simulated intensity distribution at the diffraction plane, and thus at the segmented area detector, when a 300 kV electron probe passes 0.2 Å to the left of a gallium atomic column in a 1.6 nm thick GaN crystal oriented along the [112̅ 0] direction. GaN is a common material in a wide variety of optoelectronic devices, such as blue light-emitting diodes, and has been extensively studied using DPC-STEM at nanometer resolutions, exploring the possibility of detecting the piezoelectric fields in optoelectronic devices. The probe intensity at the diffraction plane is shifted toward the Ga column due to the interaction between the incident electrons and the atomic electric field: the direction of deflection shows that the attractive force exerted on the incident electrons by the nucleus is dominant, although it is moderated by the screening electrons. The simulation exposes how the traditional picture of a rigid deflection of the probe due to the atomic electric field is only a simplification of the real effects, as described in recent experimental and theoretical , reports.…”
Section: Resultsmentioning
confidence: 99%
“…Digital-DPC was performed by applying a ‘virtual’ DPC detector to the diffraction patterns, recorded with a CCD camera, in order to compare the two techniques, and it was found that the intensity variations within the transmitted beam strongly contribute to the signal, thus rendering the method ineffective for direct field measurements. Recently in-line holography36 was used to measure the piezoelectric charge density at the quantum well interfaces, where most of the limitations imposed by specimen preparation conditions for off-axis holography are not a hindrance. However, as stated earlier, it cannot be considered a direct technique and as in-line holography needs long exposure times (~10 s/image), this can create a problem while measuring the charge density or potential in a specimen due to radiation induced charge migration and a potential build up in the illuminated area of the sample37.…”
Section: Discussionmentioning
confidence: 99%
“…For reflections far from the central beam, the rocking curve maxima can more easily be identified, which is an essential feature for mapping the orientation by the proposed method. To exclude the intensities of beams other than the desired beam a small objective aperture diameter 10 m ( = μ ) was inserted, as is also used for mapping strain by dark-field inline electron holography [17,20,21]. The range of scattering angles passing through this objective aperture corresponds nearly to the size of the first Brillouin zone.…”
Section: Methodsmentioning
confidence: 99%