2016
DOI: 10.1038/srep28459
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Direct Measurement of Polarization-Induced Fields in GaN/AlN by Nano-Beam Electron Diffraction

Abstract: The built-in piezoelectric fields in group III-nitrides can act as road blocks on the way to maximizing the efficiency of opto-electronic devices. In order to overcome this limitation, a proper characterization of these fields is necessary. In this work nano-beam electron diffraction in scanning transmission electron microscopy mode has been used to simultaneously measure the strain state and the induced piezoelectric fields in a GaN/AlN multiple quantum well system.

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Cited by 26 publications
(11 citation statements)
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“…The g value relates the applied field and radiation energy for a particular absorption and can provide information about the type and surrounding environment of the free electrons detected in the experiment. For GaN, there is little recent work employing EPR for defect identification, although there are some prior studies indicating the g values for certain defects in bulk GaN. In our tests, we identified one prominent defect at a g value of 2.008 ± 0.0005, as shown in Figure . g values of around 2.008 have been associated with N vacancies and also with Ga vacancies .…”
mentioning
confidence: 58%
“…The g value relates the applied field and radiation energy for a particular absorption and can provide information about the type and surrounding environment of the free electrons detected in the experiment. For GaN, there is little recent work employing EPR for defect identification, although there are some prior studies indicating the g values for certain defects in bulk GaN. In our tests, we identified one prominent defect at a g value of 2.008 ± 0.0005, as shown in Figure . g values of around 2.008 have been associated with N vacancies and also with Ga vacancies .…”
mentioning
confidence: 58%
“…The induced surface charge density might reach levels of σ ~5.5 × 10 13 cm −2 , which leads to fields approaching 10 MV cm −1 in the AlN and at its interface with the GaN layers 20 . These enormous polarization-induced electric fields present in III-nitride heterostructures have been recently confirmed by direct measurement with nano-beam electron diffraction 26 . The induced field creates a depletion region within the UID collector spacer and an accumulation region in the UID emitter spacer.…”
Section: Resultsmentioning
confidence: 71%
“…Figure a shows the simulated intensity distribution at the diffraction plane, and thus at the segmented area detector, when a 300 kV electron probe passes 0.2 Å to the left of a gallium atomic column in a 1.6 nm thick GaN crystal oriented along the [112̅ 0] direction. GaN is a common material in a wide variety of optoelectronic devices, such as blue light-emitting diodes, and has been extensively studied using DPC-STEM at nanometer resolutions, exploring the possibility of detecting the piezoelectric fields in optoelectronic devices. The probe intensity at the diffraction plane is shifted toward the Ga column due to the interaction between the incident electrons and the atomic electric field: the direction of deflection shows that the attractive force exerted on the incident electrons by the nucleus is dominant, although it is moderated by the screening electrons. The simulation exposes how the traditional picture of a rigid deflection of the probe due to the atomic electric field is only a simplification of the real effects, as described in recent experimental and theoretical , reports.…”
Section: Resultsmentioning
confidence: 99%