Numerical study of Si nanoparticle formation by SiCl₄hydrogenation in RF plasma

Abstract

Nanocrystalline silicon (nc-Si) is a promising material for many applications related to electronics and optoelectronics. This work performs numerical simulations in order to understand a new process with high deposition rate production of nc-Si in a radio-frequency plasma reactor. Inductive plasma formation, reaction kinetics and nanoparticle formation have been considered in a sophisticated model. Results show that the plasma parameters could be adjusted in order to improve selectivity between nanoparticle and molecule formation and, thus, the deposition rate. Also, a parametric study helps to optimize the system with appropriate operating conditions.

Three-dimensional numerical simulation of heating and melting behaviors of cerium oxide powders in radio frequency thermal plasma

“…However, the process of RF plasma spheroidizing particles involves the coupling of electric and magnetic fields, the interaction between the plasma and the particle in terms of mass, momentum and heat, which contains a considerable number of influencing factors. Numerical simulation becomes a good tool to optimize the experiment on a resource-saving basis, and helps us to understand more deeply the physical processes of the plasma processing of particles [12][13][14].…”

Gas dynamic-thermal-concentration fields and evaporation process of quartz particles in Ar–H2inductively coupled plasma

“…Since the particle evaporation efficiency at the first phase is crucial for the whole technical process, it is necessary to systematic study the gas dynamic-thermal-concentration fields and evaporation process of quartz particles in the TICP torch of argon-hydrogen plasma. Among previous works [7][8][9][10][11][12][13] the hydrogen could be added into the argon plasma through different channels: In [7] the pure hydrogen was supplied through the central channel to obtain spheroidized molybdenum powders. In [8] the reactive gas mixtures of hydrogen and SiCl 4 were supplied through the central channel to obtain Si nanoparticles.…”

“…Among previous works [7][8][9][10][11][12][13] the hydrogen could be added into the argon plasma through different channels: In [7] the pure hydrogen was supplied through the central channel to obtain spheroidized molybdenum powders. In [8] the reactive gas mixtures of hydrogen and SiCl 4 were supplied through the central channel to obtain Si nanoparticles. In [9] the argon-hydrogen mixtures served as an intermediate gas to keep the alloy powders from oxidation.…”