Numerical modeling of pyrolytic laser-induced chemical vapor deposition

Abstract

Articles you may be interested inEffect of Si and C concentration on the microstructure, and the mechanical, tribological and electrochemical properties of nanocomposite TiC/a-SiC:H/a-C:H coatings prepared by plasma enhanced chemical vapor deposition J. Appl. Phys. 111, 043512 (2012); 10.1063/1.3684602Phase-graded deposition of diamond-like carbon on nanotips by near-field induced chemical vapor deposition Laser-induced chemical vapor deposition of nanostructured silicon carbonitride thin films Laser chemical vapor deposition ͑LCVD͒ is a technique to deposit thin films of oxidation, corrosion, and wear resistant as well as electronic, optoelectronic, and superconductor materials. In order to understand the underlying mechanisms of such a process we have developed a numerical model using computational fluid dynamics ͑CFD͒. The Navier-Stokes equations governing the flow, heat transfer, and chemical reactions of the gases are solved numerically while the temperature distribution in the substrate is determined by solving the corresponding heat conduction equation. The present CFD model provides an opportunity to assess the important parameters concerning the LCVD process, such as the gas flow field, temperature distribution, concentration of reactants/ products, and deposition height. Indicative results are presented for the deposition of titanium carbide upon AISI 1060 carbon. These results provide understanding of the LCVD process and enable its optimization.