Numerical calculation of temperature, velocity, and species concentration distributions in a hot filament chemical vapor deposition in a reactor using a CH4/H2 mixture
Abstract:This study is a numerical modeling of transport phenomena occurring in the reaction chamber during diamond or amorphous hydrogenated carbon films growth by a hot filament chemical vapor deposition (HFCVD) technique. A two-dimensional model was adopted to study the HFCVD reactor. The equations of heat, momentum, and mass transfer were solved numerically; the simulation was performed using a program in FORTRAN language. All temperature, velocity, and species concentration distributions were similar at the filame… Show more
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